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Knowledge of the refractive indices and absorption coefficients of semiconductors is especially important in the design and analysis of optical and photonic devices. This book presents data on the optical constants of various elemental and compound semiconductors. A complete set of the optical constants of the semiconductors are presented in tabular and graphical forms over the entire photon-energy range. They are: the complex dielectric constant e(E)=e1(E)+ie2(E), the complex refractive index n*(E)=n(E)+ik(E), the absorption coefficient a(E), and the normal-incidence reflectivity R(E). The bo

Optical constants. --- Semiconductors --- Physical constants --- Optical properties.

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OPTICAL CONSTANTS --- SOLID STATE PHYSICS --- TABLES --- TABLES --- OPTICAL CONSTANTS --- SOLID STATE PHYSICS --- TABLES --- TABLES

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This set of five volumes, four volumes edited by Edward D. Palik and a volume by Gorachand Ghosh, is a unique resource for any science and technology library. It provides materials researchers and optical device designers with reference facts in a context not available anywhere else. The singular functionality of the set derives from the unique format for the three core volumes that comprise the Handbook of Optical Constants of Solids. The Handbook satisfies several essential needs: first, it affords the most comprehensive database of the refractive index and extinction (or loss)

Optical constants. --- Optical materials -- Tables -- Handbooks, manuals, etc. --- Optical properties. --- Refractive index -- Tables -- Handbooks, manuals, etc. --- Solids. --- Solids -- Optical properties -- Handbooks, manuals, etc.

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Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from subnanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. It follows in the footsteps of two previous books written by one of the authors with important updates to emphasize modern instrumentation and applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.

Ellipsometry. --- Thin films --- Spectrum analysis --- Analysis, Spectrum --- Spectra --- Spectrochemical analysis --- Spectrochemistry --- Spectrometry --- Spectroscopy --- Chemistry, Analytic --- Interferometry --- Optics --- Radiation --- Wave-motion, Theory of --- Absorption spectra --- Light --- Spectroscope --- Films, Thin --- Solid film --- Solid state electronics --- Solids --- Surfaces (Technology) --- Coatings --- Thick films --- Polarimetry --- Polarization (Light) --- Measurement. --- Qualitative --- Cauchy equation --- dispersion equations --- ellipsometry --- optical constants --- polarized light --- refractive index --- thin film thickness --- Analytical chemistry

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This book contains the articles collected for the Special Issue entitled "Micro-nano Surface Functionalization of Materials and Thin Films for Optical Applications" in the journal Coatings (ISSN 2079-6412). These selected articles provide a meaningful overview of recent advances and concepts beyond the state-of-the-art regarding surface functionalization of materials and deposition of thin films to be used in optical applications. The aim was to cover all relevant aspects of the topic (simulation, design, fabrication, characterization and applications) with a special emphasis on non-conventional methods for surface modification of materials, combinations of mature fabrication routes with emerging technologies (i.e., additive manufacturing) and large-area fabrication concepts to pave the way to an industrial utilization of the developed materials. This overview comprises the recent work of reputed scientists from Germany, Austria, Spain and India on: - New developments on the scale-up deposition of transparent conductive materials by magnetron sputtering,- Design of hierarchical surface structures at different scale lengths for nanoimprinting of optical nano- and micro-structures, - Non-conventional preparation of rutile-type TiO2 films at room temperature for optical applications on heat-sensitive substrates, - Design of spectrally selective solar absorber coatings based on computational simulation and ellipsometry measurements.

Research & information: general --- reactive magnetron sputtering --- transparent conductive oxide --- electronic transport --- doping efficiency --- tin dioxide --- Nanoimprint lithography --- UV-NIL --- reversal NIL --- liquid transfer imprint lithography --- hierarchical structures --- optical micro- and nanostructures --- ITO thin films --- magnetron sputtering --- low temperature deposition --- oxygen flow --- microstructure --- optoelectronic properties --- transparent heaters --- titanium oxide films --- filtered cathodic vacuum arc --- rutile --- optical coatings --- spectrally selective absorber --- multilayer stack --- spectroscopic ellipsometry --- optical constants --- simulation --- reactive magnetron sputtering --- transparent conductive oxide --- electronic transport --- doping efficiency --- tin dioxide --- Nanoimprint lithography --- UV-NIL --- reversal NIL --- liquid transfer imprint lithography --- hierarchical structures --- optical micro- and nanostructures --- ITO thin films --- magnetron sputtering --- low temperature deposition --- oxygen flow --- microstructure --- optoelectronic properties --- transparent heaters --- titanium oxide films --- filtered cathodic vacuum arc --- rutile --- optical coatings --- spectrally selective absorber --- multilayer stack --- spectroscopic ellipsometry --- optical constants --- simulation