Choose an application

• Reference Manager
• EndNote
• RefWorks (Direct export to RefWorks)

Inorganic compounds --- Synthesis. --- 546.057 --- -Solid state chemistry --- #WSCH:AAS1 --- 546 --- 620.2 --- 66.09 --- 661.6 --- CVD chemical vapour deposition --- anorganische materialen --- biokeramiek --- materialen --- nanogestructureerde materialen --- polymeren --- siliconen --- sinteren --- sport --- vaste stoffen --- vloeistoffen --- Chemistry, Solid state --- Chemistry, Physical and theoretical --- Compounds, Inorganic --- Inorganic chemicals --- Chemicals --- Chemistry, Inorganic --- Inorganic chemistry--?.057 --- Synthesis --- anorganische chemie --- Solid state chemistry. --- 546.057 Inorganic chemistry--?.057 --- Solid state chemistry --- Chemistry, Synthetic inorganic --- Inorganic synthesis (Chemistry) --- Synthetic inorganic chemistry --- Inorganic compounds - Synthesis.

Choose an application

• Reference Manager
• EndNote
• RefWorks (Direct export to RefWorks)

With the increasing global usage of water and the continuous addition of contaminants to water sources, new challenges have arisen that are associated with the abatement of organic pollutants, particularly those that are refractory to conventional water and wastewater treatment technologies. Advanced oxidation processes (AOPs) present a competitive alternative to promote the oxidation of organic contaminants by strong oxidative radicals generated from oxygen, ozone, wet peroxide, and UV radiation. The use of catalysts not only improves efficiency but may present remarkable cost advantages for practical applications of AOPs in the abatement of several pollutants. In this Special Issue of Catalysts, we invite authors to submit original research papers focused on the synthesis and characterization of novel heterogeneous catalysts and their uses in advanced oxidation processes for the removal of organic pollutants from aqueous solutions.

CdS --- Bi2MoO6 microspheres --- antibiotic removal --- charge separation --- visible-light-driven --- carbon xerogel --- carbon nanotubes --- activated carbon --- adsorption --- catalytic wet peroxidation --- heterogeneous Fenton’s oxidation --- p-nitrophenol --- magnetic materials --- chemical vapour deposition --- photocatalytic ozonation --- organic pollutants --- advanced oxidation process --- wastewater treatment --- contaminants of emerging concern --- pharmaceuticals --- environmental catalysis --- biochar --- iron mineral --- heterogeneous catalysts --- antibiotic --- advanced oxidation processes --- water treatment --- Fenton reactions --- LCA --- environmental impact --- Fenton --- photocatalysis --- visible light --- SBA15 --- magnetite --- graphene --- tin oxide --- antimony doped tin oxide --- electrochemical oxidation --- atomic layer deposition --- TiO2-SiO2 --- immobilized photocatalyst --- methylene blue adsorption --- metal-free carbon catalysts --- N, S-co-doping --- catalytic wet air oxidation --- n/a --- heterogeneous Fenton's oxidation

Choose an application

• Reference Manager
• EndNote
• RefWorks (Direct export to RefWorks)

With the increasing global usage of water and the continuous addition of contaminants to water sources, new challenges have arisen that are associated with the abatement of organic pollutants, particularly those that are refractory to conventional water and wastewater treatment technologies. Advanced oxidation processes (AOPs) present a competitive alternative to promote the oxidation of organic contaminants by strong oxidative radicals generated from oxygen, ozone, wet peroxide, and UV radiation. The use of catalysts not only improves efficiency but may present remarkable cost advantages for practical applications of AOPs in the abatement of several pollutants. In this Special Issue of Catalysts, we invite authors to submit original research papers focused on the synthesis and characterization of novel heterogeneous catalysts and their uses in advanced oxidation processes for the removal of organic pollutants from aqueous solutions.

Technology: general issues --- History of engineering & technology --- CdS --- Bi2MoO6 microspheres --- antibiotic removal --- charge separation --- visible-light-driven --- carbon xerogel --- carbon nanotubes --- activated carbon --- adsorption --- catalytic wet peroxidation --- heterogeneous Fenton's oxidation --- p-nitrophenol --- magnetic materials --- chemical vapour deposition --- photocatalytic ozonation --- organic pollutants --- advanced oxidation process --- wastewater treatment --- contaminants of emerging concern --- pharmaceuticals --- environmental catalysis --- biochar --- iron mineral --- heterogeneous catalysts --- antibiotic --- advanced oxidation processes --- water treatment --- Fenton reactions --- LCA --- environmental impact --- Fenton --- photocatalysis --- visible light --- SBA15 --- magnetite --- graphene --- tin oxide --- antimony doped tin oxide --- electrochemical oxidation --- atomic layer deposition --- TiO2-SiO2 --- immobilized photocatalyst --- methylene blue adsorption --- metal-free carbon catalysts --- N, S-co-doping --- catalytic wet air oxidation

Choose an application

• Reference Manager
• EndNote
• RefWorks (Direct export to RefWorks)

This Special Issue will compile recent developments in the field of metal oxide thin film deposition. The articles presented in this Special Issue will cover various topics, ranging from, but not limited to, the optimization of deposition methods, thin film preparations, the functionalization of surfaces with targeted applications, nanosensors, catalysis, electronic devices, biocidal coating, and the synthesis of nanostructures via the accurate control of thin film deposition methods, among others. Topics are open to metal oxide thin film deposition and characterization for the development of applications.

Technology: general issues --- History of engineering & technology --- Materials science --- plasma electrolytic oxidation --- electrical characteristic --- anodizing --- SEM --- aluminum --- low-temperature fabrication --- ions adsorption --- IGZO TFTs --- device performance --- oxidation --- wide-bandgap semiconductor --- α-Ga2O3 --- mist chemical vapor deposition (mist-CVD) --- carrier gas --- transparent semiconductor --- cellulose --- tribological performance --- stability --- MAO (micro-arc oxidation) coating --- self-lubricating --- gadolinium cobaltites --- atomic layer deposition --- β-diketonates --- ozone --- preferential crystal growth orientation --- high-aspect-ratio substrate --- metal oxide thin films --- ALD --- crystallography --- epitaxy --- NiTiO3 --- tin oxide --- thin films --- atmospheric pressure chemical vapour deposition transport properties --- magnetoresistance --- impedance spectroscopy --- charge carrier mobility --- dynamic hot-probe measurements --- indium-tin oxide --- aluminum-zinc oxide --- magnetron co-sputtering --- bismuth ferrite --- La-doping --- piezoelectricity --- sol-gel

Choose an application

• Reference Manager
• EndNote
• RefWorks (Direct export to RefWorks)

This book entitled "Feature Papers in Electronic Materials Section" is a collection of selected papers recently published on the journal Materials, focusing on the latest advances in electronic materials and devices in different fields (e.g., power- and high-frequency electronics, optoelectronic devices, detectors, etc.). In the first part of the book, many articles are dedicated to wide band gap semiconductors (e.g., SiC, GaN, Ga2O3, diamond), focusing on the current relevant materials and devices technology issues. The second part of the book is a miscellaneous of other electronics materials for various applications, including two-dimensional materials for optoelectronic and high-frequency devices. Finally, some recent advances in materials and flexible sensors for bioelectronics and medical applications are presented at the end of the book.

vertical GaN --- quasi-vertical GaN --- reliability --- trapping --- degradation --- MOS --- trench MOS --- threshold voltage --- nanomanufacturing --- high-throughput method --- material printing --- flexible bioelectronics --- nanomembrane --- hybrid integration --- GaAs --- InGaAs channel --- epitaxial lift-off --- HEMT --- van der Waals --- 3C-SiC --- stacking faults --- doping --- KOH etching --- silicon carbide --- radiation hardness --- proton and electron irradiation --- charge removal rate --- compensation --- irradiation temperature --- heteroepitaxy --- bulk growth --- compliant substrates --- defects --- stress --- cubic silicon carbide --- power electronics --- thin film --- iron-based superconductor --- pulsed laser deposition --- transmission electron microscopy --- diamond --- MPCVD growth --- electron microscopy --- chemical vapour deposition --- 2D materials --- MoS2 --- silica point defects --- optical fibers --- radiation effects --- 4H-SiC --- ohmic contact --- SIMS --- Ti3SiC2 --- simulation --- Schottky barrier --- Schottky diodes --- electrical characterization --- graphene absorption --- Fabry–Perot filter --- radio frequency sputtering --- CVD graphene --- GaN --- thermal management --- GaN-on-diamond --- CVD --- arrhythmia detection --- cardiovascular monitoring --- soft biosensors --- wearable sensors --- flexible electronics --- gate dielectric --- aluminum oxide --- interface --- traps --- instability --- insulators --- binary oxides --- high-κ dielectrics --- wide band gap semiconductors --- energy electronics --- ultra-wide bandgap --- diodes --- transistors --- gallium oxide --- Ga2O3 --- spinel --- ZnGa2O4