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Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates—Si, Ge, poly-Si, GaAs, and SiC—and using different catalysts—Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale—nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications.

porous silicon --- Pd nanoparticles-assisted chemical etching --- etching rate --- ethanol electrooxidation --- X-ray diffractive optics --- zone plate --- high aspect ratio nanostructures --- metal-assisted chemical etching --- electroless deposition --- Al2O3 nanotube --- ultra-high aspect ratio --- gold (Au) metal assisted chemical etching --- atomic layer deposition --- anisotropic dry etching --- silicon cones --- metal assisted chemical etching --- transversal pores --- antireflection --- black GaAs --- photon recycling --- X-ray grating interferometry --- catalyst --- silicon --- gold electroplating --- magnetically guided metal-assisted chemical etching --- bulk Si etching --- curved Si structure --- catalyst encapsulation --- n/a

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Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates—Si, Ge, poly-Si, GaAs, and SiC—and using different catalysts—Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale—nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications.

History of engineering & technology --- porous silicon --- Pd nanoparticles-assisted chemical etching --- etching rate --- ethanol electrooxidation --- X-ray diffractive optics --- zone plate --- high aspect ratio nanostructures --- metal-assisted chemical etching --- electroless deposition --- Al2O3 nanotube --- ultra-high aspect ratio --- gold (Au) metal assisted chemical etching --- atomic layer deposition --- anisotropic dry etching --- silicon cones --- metal assisted chemical etching --- transversal pores --- antireflection --- black GaAs --- photon recycling --- X-ray grating interferometry --- catalyst --- silicon --- gold electroplating --- magnetically guided metal-assisted chemical etching --- bulk Si etching --- curved Si structure --- catalyst encapsulation --- porous silicon --- Pd nanoparticles-assisted chemical etching --- etching rate --- ethanol electrooxidation --- X-ray diffractive optics --- zone plate --- high aspect ratio nanostructures --- metal-assisted chemical etching --- electroless deposition --- Al2O3 nanotube --- ultra-high aspect ratio --- gold (Au) metal assisted chemical etching --- atomic layer deposition --- anisotropic dry etching --- silicon cones --- metal assisted chemical etching --- transversal pores --- antireflection --- black GaAs --- photon recycling --- X-ray grating interferometry --- catalyst --- silicon --- gold electroplating --- magnetically guided metal-assisted chemical etching --- bulk Si etching --- curved Si structure --- catalyst encapsulation

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Silica and silicon-based nanostructures are now well-understood materials for which the technologies are mature. The most obvious applications, such as electronic devices, have been widely explored over the last two decades. The aim of this Special Issue is to bring together the state of the art in the field and to enable the emergence of new ideas and concepts for silicon and silica-based nanostructures.

Research & information: general --- Physics --- maize --- NPK --- SiO2-NPs --- productivity --- fertilizer --- mineral --- weevils --- LC50 --- toxicity --- mesoporous silica --- nanomaterials --- desulfurization --- fuel --- JP-8 --- black silicon --- light absorption enhanced --- micro-nano manufacturing --- nanometer surface --- nano-silica --- tricalcium aluminate --- pozzolanic reaction --- C-A-S-H gel --- silicon nanoparticles --- silicon nanowires --- synthesis --- high energy density --- lithium-ion batteries --- high-capacity anode --- VLS --- laser pyrolysis --- size effect --- shape effect --- biomass rice husk --- silicon --- nanocrystals --- luminescence --- high porosity --- pH sensor --- temperature sensor --- dual sensor --- metal-assisted chemical etching --- Si nanostructures --- high aspect ratio --- zone plate --- silicon nanowire --- nanowire array --- silicon anode --- n-type silicon anode --- Li-ion battery --- nanowires --- nanonets --- transistor --- integration process --- n/a --- Research. --- Physics.

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Silica and silicon-based nanostructures are now well-understood materials for which the technologies are mature. The most obvious applications, such as electronic devices, have been widely explored over the last two decades. The aim of this Special Issue is to bring together the state of the art in the field and to enable the emergence of new ideas and concepts for silicon and silica-based nanostructures.

Research. --- Physics. --- maize --- NPK --- SiO2-NPs --- productivity --- fertilizer --- mineral --- weevils --- LC50 --- toxicity --- mesoporous silica --- nanomaterials --- desulfurization --- fuel --- JP-8 --- black silicon --- light absorption enhanced --- micro-nano manufacturing --- nanometer surface --- nano-silica --- tricalcium aluminate --- pozzolanic reaction --- C-A-S-H gel --- silicon nanoparticles --- silicon nanowires --- synthesis --- high energy density --- lithium-ion batteries --- high-capacity anode --- VLS --- laser pyrolysis --- size effect --- shape effect --- biomass rice husk --- silicon --- nanocrystals --- luminescence --- high porosity --- pH sensor --- temperature sensor --- dual sensor --- metal-assisted chemical etching --- Si nanostructures --- high aspect ratio --- zone plate --- silicon nanowire --- nanowire array --- silicon anode --- n-type silicon anode --- Li-ion battery --- nanowires --- nanonets --- transistor --- integration process --- maize --- NPK --- SiO2-NPs --- productivity --- fertilizer --- mineral --- weevils --- LC50 --- toxicity --- mesoporous silica --- nanomaterials --- desulfurization --- fuel --- JP-8 --- black silicon --- light absorption enhanced --- micro-nano manufacturing --- nanometer surface --- nano-silica --- tricalcium aluminate --- pozzolanic reaction --- C-A-S-H gel --- silicon nanoparticles --- silicon nanowires --- synthesis --- high energy density --- lithium-ion batteries --- high-capacity anode --- VLS --- laser pyrolysis --- size effect --- shape effect --- biomass rice husk --- silicon --- nanocrystals --- luminescence --- high porosity --- pH sensor --- temperature sensor --- dual sensor --- metal-assisted chemical etching --- Si nanostructures --- high aspect ratio --- zone plate --- silicon nanowire --- nanowire array --- silicon anode --- n-type silicon anode --- Li-ion battery --- nanowires --- nanonets --- transistor --- integration process

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This book contains the scientific contributions to the Special Issue entitled: "New Trends and Applications in Femtosecond Laser Micromachining". It covers an array of subjects, from the basics of femtosecond laser micromachining to specific applications in a broad spectra of fields such biology, photonics and medicine.

Research & information: general --- Physics --- Optical physics --- ultrafast laser microfabrication --- microfluidic --- glass bonding --- ultrashort laser pulses --- heat accumulation --- transparent materials --- quartz --- stealth dicing --- femtosecond --- fused silica --- double pulses --- selective chemical etching --- cell elasticity --- endothelial cells --- optical micromanipulation --- holographic optical tweezers --- two-photon polymerization --- image processing --- micromodels --- porous media --- 3D multi-depth channels --- laser machining --- femtosecond laser micromachining --- femtosecond laser material processing --- micro/nanotechnology fabrication --- atomic force microscope --- laser ablation diameter --- separation distance (SW) --- sub-micron bridges --- YBCO thin film --- photonic quantum chip --- femtosecond laser direct writing --- Hadamard gate --- CNOT gate --- path-encoded Bell state --- femtosecond laser --- fs-assisted cataract surgery --- laser-assisted ophthalmic surgery --- high pulse frequency --- low energy --- roughness analysis --- thermal annealing --- integrated optics --- glass micromachining --- 3D structuring --- n/a