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X-ray photoelectron spectroscopy
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ISBN: 1617282405 9781617282409 9781616689155 1616689153 Year: 2011 Publisher: New York

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X-ray photoelectron spectroscopy (XPS) is a quantitative spectroscopic technique that measures the elemental composition, empirical formula, chemical state and electronic state of the elements that exist within a material. XPS spectra are obtained by irradiating a material with a beam of X-rays while simultaneously measuring the kinetic energy (KE) and number of electrons that escape from the top 1 to 10 nm of the material being analyzed. This book reviews research in the field of X-ray photoelectron spectroscopy including: XPS studies from industrial and bioactive glass to biomaterials and


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Portable x-ray fluorescence spectrometry : capabilities for in situ analysis
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ISBN: 9780854045525 9781847558640 085404552X 184755864X Year: 2008 Publisher: Cambridge, UK : RSC Publishing

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"Portable X-ray Fluorescence Spectrometry: Capabilities for In Situ Analysis demonstrates the wide range of applications for the technique. Whilst many authors use commercially available instrumentation, applications such as the analysis of museum samples, works of art and extraterrestrial analysis demonstrate the ingenuity of the authors to develop and build equipment for specific studies, sampling, quantification and correction procedures are presented to give the reader a comprehensive introduction to the capabilities of PXRF for in situ analysis. Chapters are written by internationally recognised scientists with practical experience of in situ analysis using portable X-ray fluorescence. The book will be of interest to analytical scientists, environmental and geological scientists, industrial hygienists, industrial and plant scientists, archaeologists and museum researchers, research scientists and students."--Jacket.

Practical surface analysis. 1 : Auger and X-ray photoelectron spectroscopy
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ISBN: 0471920827 0471920819 9780471920816 9780471920823 Year: 1990 Publisher: Chichester Wiley

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Hard X-ray Photoelectron Spectroscopy (HAXPES)
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ISBN: 3319240412 3319240439 Year: 2016 Publisher: Cham : Springer International Publishing : Imprint: Springer,

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This book provides the first complete and up-to-date summary of the state of the art in HAXPES and motivates readers to harness its powerful capabilities in their own research. The chapters are written by experts. They include historical work, modern instrumentation, theory and applications. This book spans from physics to chemistry and materials science and engineering. In consideration of the rapid development of the technique, several chapters include highlights illustrating future opportunities as well.


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Auger- and x-ray photoelectron spectroscopy in materials science : a user-oriented guide
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ISBN: 3642273807 3642431739 3642273815 Year: 2012 Volume: 49 Publisher: Berlin ; Heidelberg : Springer,

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To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.  .

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