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Plasma etching : fundamentals and applications
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ISBN: 019856287X Year: 1998 Publisher: Oxford Oxford university press

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Etching characteristics and surface analysis of molecular bean epitaxy grown P-type aluminum gallium nitride with boron trichloride/chlorine gases in inductively coupled plasma (ICP) dry etching
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Year: 2004 Publisher: Adelphi, MD : Army Research Laboratory,

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Plasma processes for semiconductor fabrication.
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ISBN: 0521591759 Year: 1999 Publisher: Cambridge Cambridge University press

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Advanced etch technology for nanopatterning.
ISBN: 9780819489845 Year: 2012 Publisher: Bellingham SPIE

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Plasma processes for semiconductor fabrication
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ISBN: 0511529511 Year: 1999 Publisher: Cambridge : Cambridge University Press,

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Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then covers plasma chemistry, and describes in detail the modelling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practising engineers in the semiconductor industry.


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Plasma etching in semiconductor fabrication
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ISBN: 0444424199 9780444424198 Year: 1985 Volume: 1 Publisher: Amsterdam Oxford Tokyo Elsevier

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Plasma etching : an introduction.
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ISBN: 0124693709 0080924468 9780124693708 Year: 1989 Publisher: Boston Academic press

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Introduction to microlithography
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ISBN: 0841228485 9780841228481 Year: 1994 Publisher: New York (N.Y.): American chemical society,

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Etching in microsystem technology
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ISBN: 3527295615 Year: 1999 Publisher: Weinheim Wiley-VCH

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Dissertation
High-flux reactive-ion etching in a magnetic multipole reactor
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Year: 1989 Publisher: S.l. : s.n.,

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