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Advances in resist technology and processing XXI.
ISBN: 0819452890 Year: 2004 Publisher: Bellingham SPIE

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Microlithography --- Photoresists

Book

Advances in resist materials and processing technology XXVII.
Authors: Allen, Robert D. --- Somervell, Mark H.
ISBN: 9780819480538 Year: 2010 Publisher: Bellingham SPIE

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Microlithography --- Photoresists

Advances in resist technology and processing XIX.
ISBN: 0819444367 Year: 2002 Publisher: Bellingham SPIE

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Microlithography --- Photoresists

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Advances in resist materials and processing technology XXV.
ISBN: 9780819471086 Year: 2008 Publisher: Bellingham SPIE

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Microlithography --- Photoresists

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Advances in resist materials and processing technology XXVI.
ISBN: 9780819475268 Year: 2009 Publisher: Bellingham SPIE

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Microlithography --- Photoresists

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Advances in resist materials and processing technology XXIV.
Author: Lin, Qinghuang
ISBN: 9780819466389 Year: 2007 Publisher: Bellingham SPIE

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Microlithography --- Photoresists

Advances in resist technology and processing XXII.
Author: Sturtevant, John L.
ISBN: 0819457337 Year: 2005 Publisher: Bellingham SPIE

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Microlithography --- Photoresists

Advances in resist technology and processing XVIII.
ISBN: 0819440310 Year: 2001 Publisher: Bellingham SPIE

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Microlithography --- Photoresists

Microlithography : process technology for IC fabrication
Author: Elliott, David J.
ISBN: 9780070193048 0070193045 Year: 1986 Publisher: New York: McGraw-Hill,

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Integrated circuits --- Microlithography --- Photoresists

Book

Submicron lithography
Authors: Blais, Phillip D. --- International Society for Hybrid Microelectronics. --- Northern California Microphotomask/Masking Working Group. --- Materials Research Society.
ISBN: 0892523689 Year: 1982 Publisher: Bellingham (Wash.) : International Society for Optical Engineering,

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Photolithography --- Photoresists --- Congresses.

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