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This thesis by Ludvig Landälv focuses on the characterization of new oxide coatings deposited by physical vapor deposition (PVD) techniques, specifically within the Cr-Zr-O and Al-Cr-Si-O systems. The research examines the thermal stability of these coatings, particularly the transformation of phases upon annealing and the influence of adding silicon to the Al-Cr cathode on plasma process parameters and coating properties. The work aims to improve the wear resistance and performance of machining tools by optimizing coating materials. It is intended for materials scientists, researchers in thin film physics, and professionals in the metal machining industry.

Physical vapor deposition. --- Oxide coating.

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Heat resistant materials --- Oxide coating. --- Corrosion.

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Passivation of Metals and Semiconductors, and Properties of Thin Oxide Layers contains a selection of papers presented at PASSIVITY-9, the 9th International Symposium on the Passivation of Metals and Semiconductors and the Properties of Thin Oxide Layers, which was held in Paris, 27 June - 1 July, 2005. One hundred and twelve peer-reviewed manuscripts have been included. The book covers all the fundamental and applied aspects of passivity and provides a relevant and updated view of the advances and new trends in the field. It is structured in ten sections: Growth,

Passivity (Chemistry) --- Electrochemistry --- Metals --- Semiconductors --- Corrosion and anti-corrosives --- Oxide coating --- Chemical reaction, Conditions and laws of --- Protective coatings --- Thin films

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Metals --- Nanostructured materials. --- Metallic oxides --- Anodic oxidation. --- Industrial applications. --- Metal oxides --- Oxides --- Nanomaterials --- Nanometer materials --- Nanophase materials --- Nanostructure controlled materials --- Nanostructure materials --- Ultra-fine microstructure materials --- Microstructure --- Nanotechnology --- Anodic oxidation of metals --- Anodizing --- Electrolytic oxidation --- Oxide coating --- Protective coatings --- Oxidation, Anodic

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This book summarizes the current knowledge of two-dimensional oxide materials. The fundamental properties of 2-D oxide systems are explored in terms of atomic structure, electronic behavior and surface chemistry.  The concept of polarity in determining the stability of 2-D oxide layers is examined, charge transfer effects in ultrathin oxide films are reviewed as well as the role of defects in 2-D oxide films. The novel structure concepts that apply in oxide systems of low dimensionality are addressed,  and a chapter giving an overview of state-of-the-art theoretical methods for electronic structure determination of nanostructured oxides is included. Special emphasis is given to a balanced view from the experimental and the theoretical side. Two-dimensional materials, and 2-D oxides in particular, have outstanding behavior due to dimensionality and proximity effects. Several chapters treat prototypical model systems as illustrative examples to discuss the peculiar physical and chemical properties of 2-D oxide systems. The chapters are written by renowned experts in the field.

Materials science. --- Nanochemistry. --- Semiconductors. --- Surfaces (Physics). --- Interfaces (Physical sciences). --- Thin films. --- Optical materials. --- Electronic materials. --- Materials --- Materials Science. --- Optical and Electronic Materials. --- Surface and Interface Science, Thin Films. --- Surfaces and Interfaces, Thin Films. --- Surfaces. --- Oxides. --- Oxide coating. --- Protective coatings --- Thin films --- Chalcogenides --- Oxygen compounds --- Nanoscale chemistry --- Chemistry, Analytic --- Nanoscience --- Optics --- Physics --- Surface chemistry --- Surfaces (Technology) --- Materials—Surfaces. --- Crystalline semiconductors --- Semi-conductors --- Semiconducting materials --- Semiconductor devices --- Crystals --- Electrical engineering --- Electronics --- Solid state electronics --- Analytical chemistry --- Films, Thin --- Solid film --- Solids --- Coatings --- Thick films --- Surfaces (Physics) --- Electronic materials