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This International Standard provides a framework for introducing nanoelectronics into large scale, high volume production in semiconductor manufacturing facilities through the incorporation of nanomaterials (e.g. carbon nanotubes, graphene, quantum dots, etc.). Since semiconductor manufacturing facilities need to incorporate practices that maintain high yields, there are very strict requirements for how manufacturing is performed. Nanomaterials represent a potential contaminant in semiconductor manufacturing facilities and need to be introduced in a structured and methodical way. This International Standard provides steps employed to facilitate the introduction of nanomaterials into the semiconductor manufacturing facilities. This sequence is described below under the areas of raw materials acquisition, materials processing, design, IC fabrication, testing, and end-use. These activities represent the major stages of the supply chain in semiconductor manufacturing facilities.
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3M NANO is the annual International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, which will be held in 2023 in Chengdu, China The ultimate ambition of this new conference series is to bridge the gap between nanosciences and engineering sciences, aiming at emerging market and technology opportunities The advanced technologies for manipulation, manufacturing and measurement on the nanoscale promise novel revolutionary products and methods in numerous areas of application Scientists working in research fields related to 3M NANO topics are invited to submit papers.
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Nanomanufacturing. --- Manufacturing processes --- Nanotechnology
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Nanomanufacturing --- Manufacturing processes --- Nanotechnology
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Nanomanufacturing --- Nanostructured materials --- Nanotechnology
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Nanomanufacturing. --- Nanostructured materials --- Measurement.
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Micromachining. --- Nanomanufacturing. --- Manufacturing processes --- Nanotechnology --- Machining
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The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new
Block copolymers. --- Self-assembly (Chemistry) --- Nanomanufacturing.
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