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2023 15th International Congress Mechatronic Integration Discourse (MID)
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ISBN: 9798350374735 Year: 2023 Publisher: Piscataway, New Jersey : IEEE,

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2016 12th International Congress Molded Interconnect Devices (MID)
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ISBN: 1509054286 1509054294 Year: 2016 Publisher: Piscataway, NJ : IEEE,

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Annotation Due to a direct application of conductor tracks and functional structures on randomly shaped substrates, the technology MID (Molded Interconnect Devices Mechatronic Integrated Devices) enables the production of highly integrated mechatronic products. Since 1994, the Research Association 3 D MID biennially organizes the International Congress Molded Interconnect Devices in Germany in order to support the further development of the technology by offering a platform for the global transfer of knowledge and information. With about 300 participants from all over the world this international recognized conference is the worlds leading event in the field of MID Further information http://www.3dmid.de/technology.html.


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2018 13th International Congress Molded Interconnect Devices : September 25-26 2018, Würzburg, Germany
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ISBN: 1538649330 1538649349 Year: 2018 Publisher: Piscataway, New Jersey : Institute of Electrical and Electronics Engineers,

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11th international congress molded interconnect devices
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ISBN: 9783038266365 3038266361 9783038352525 Year: 2014 Publisher: Pfaffikon, Switzerland Enfield, New Hampshire

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Collection of selected, peer reviewed papers from the 11 th International Congress Molded Interconnect Devices (MID 2014), September 24-25, 2014, Nuremberg / Fuerth, Germany. The 16 papers are grouped as follows: Chapter 1: Development and Prototyping, Chapter 2: Printing Technologies, Chapter 3: Materials and Manufacturing, Chapter 4: Manufacturing Processes, Chapter 5: Assembly Technologies and Inspection, Chapter 6: Quality and Reliability.


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Plasma etching processes for interconnect realization in VLSI
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ISBN: 9781785480157 9780081005903 0081005903 1785480154 Year: 2015 Publisher: London Oxford

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Plasma etching processes for interconnect realization in VLSI
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Year: 2015 Publisher: London, [England] ; Oxford, [England] : ISTE Press : Elsevier,

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This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions.


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Plasma etching processes for interconnect realization in VLSI
Author:
Year: 2015 Publisher: London, [England] ; Oxford, [England] : ISTE Press : Elsevier,

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This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions.

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