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This dissertation by Smita G. Rao investigates alloy-based thin films synthesized through magnetron sputtering, focusing on the CrFeCoNi nitrogen-containing system. Utilizing both theoretical and experimental methods, the study explores phase formation in this system, particularly the stabilization of different crystal structures depending on nitrogen content and growth conditions. The research highlights the importance of phase diagrams for developing complex structures for applications such as irradiation resistance and epitaxial films. The work underscores the role of kinetic energy in film growth, provided by ion bombardment, to improve epitaxy quality.

Magnetron sputtering. --- Alloys.

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The book discusses the experimental and theoretical studies related to a thin film deposition technique called high power impulse magnetron sputtering (HiPIMS). It delves into the plasma properties and their influence on the coating. The book further explores the dynamics of the charged species and their effect on thin film growth in the HiPIMS process. It also investigates the energy flux and the complete discharge regime. Using the results and ideas from the fundamental plasma, the book maps out different coating improvements, the concept of sideways deposition of thin films, and the densification process of thin films using HiPIMS.

Thin Films. --- Magnetron Sputtering.

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This licentiate thesis by Babak Bakhit explores the growth and properties of transition metal diboride thin films using magnetron sputtering with metal-ion irradiation. The research focuses on controlling the crystalline phase and stoichiometry of these materials, which are known for their high melting temperatures and suitability in extreme thermal and chemical environments. The thesis highlights the potential applications of transition metal diborides in aerospace, nuclear reactors, and advanced electronics due to their unique combination of hardness, thermal conductivity, and electrical properties. The work is supported by various research grants and contributes to the field of materials science by addressing challenges in film composition and proposing strategies to enhance both hardness and toughness of the films. The intended audience includes researchers and professionals in materials science and engineering.

Thin films. --- Magnetron sputtering.

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This dissertation by Rommel Paulo B. Viloan explores innovative methods to enhance ion energy in thin film deposition using high-power impulse magnetron sputtering (HiPIMS). The study investigates strategies to increase ion energies without substrate bias, focusing on bipolar HiPIMS to optimize ion acceleration. The work examines the impact on crystal growth and film properties, such as stress and hardness, specifically in TiN films. The research aims to provide solutions for industrial applications where substrate biasing is challenging. Intended for a scientific audience, it contributes to advancements in thin film technology and material science.

Magnetron sputtering. --- Thin films.

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This dissertation explores the reactive high power impulse magnetron sputtering (HiPIMS) of metal oxides, focusing on understanding the fundamental mechanisms and improving film deposition processes. The research investigates the stabilization of HiPIMS processes in the transition zone between metal and compound modes for materials such as Al-O, Ce-O, and Ti-O. It compares these processes with direct current magnetron sputtering (DCMS) and examines the impact of various sputtering conditions. Key findings include the elimination or suppression of the hysteresis effect, leading to stable deposition with higher rates. The study also analyzes the discharge current behavior, ion compositions, and energy distributions, providing insights into film growth and properties. The work aims to demonstrate high-quality metal oxide film growth without feedback control systems and is intended for researchers in plasma coatings and materials science.

Magnetron sputtering. --- Thin films.