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This book describes the operation of a particular technique for the production of compound semiconductor materials. It describes how the technique works, how it can be used for the growth of particular materials and structures, and the application of these materials for specific devices. It contains not only a fundamental description of the operation of the technique but also contains lists of data useful for the everyday operation of OMVPE reactors. It also offers specific recipes that can be used to produce a wide range of specific materials, structures, and devices.Key Features*

Compound semiconductors --- Metal organic chemical vapor deposition --- Semiconductors --- Metal organic vapor phase epitaxy --- Metallorganic vapor phase epitaxy --- MOCVD (Vapor deposition) --- MOVPE (Vapor deposition) --- OMCVD (Vapor deposition) --- OMVPE (Vapor deposition) --- Organo-metal vapor phase epitaxy --- Organometallic chemical vapor deposition --- Organometallic vapor phase epitaxy --- Chemical vapor deposition --- Compound semiconductors. --- Metallic organic chemical vapor deposition.

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Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors.

Organometallic compounds --- Metal organic chemical vapor deposition --- Chemical vapor deposition --- Synthesis --- Metallo-organic compounds --- Metalloids, Organic --- Metalorganic compounds --- Organometalloids --- Organic compounds --- Metal organic vapor phase epitaxy --- Metallorganic vapor phase epitaxy --- MOCVD (Vapor deposition) --- MOVPE (Vapor deposition) --- OMCVD (Vapor deposition) --- OMVPE (Vapor deposition) --- Organo-metal vapor phase epitaxy --- Organometallic chemical vapor deposition --- Organometallic vapor phase epitaxy --- CVD (Chemical vapor deposition) --- Deposition, Chemical vapor --- Vapor deposition, Chemical --- Vapor-plating --- Organometallic compounds - Synthesis

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Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue “Advances in Chemical Vapor Deposition” is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices.

Technology: general issues --- APCVD --- VO2 --- processing parameters --- 2D --- chemical vapor deposition --- atomic layer deposition --- aluminum oxide --- aluminum tri-sec-butoxide --- thin film --- carbon nanotubes --- residual gas adsorption --- residual gas desorption --- field emission --- atmospheric pressure CVD --- low pressure CVD --- hybrid CVD --- aerosol assisted CVD --- pulsed CVD --- perovskite photovoltaic nanomaterials --- stabilization --- structural design --- performance optimization --- solar cells --- anatase single crystals --- process-induced nanostructures --- competitive growth --- pp-MOCVD --- vanadium pentoxide --- electrochromic --- spray pyrolysis --- ammonium metavanadate --- CVD --- electrochromism --- perovskite photovoltaic materials --- TiO2 --- Al2O3 --- V2O5 --- computational fluid dynamics

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Today, thin films are near-ubiquitous and are utilised in a very wide range of industrially and scientifically important areas. These include familiar everyday instances such as anti-reflective coatings on ophthalmic lenses, smartphone optics, photovoltaics, decorative, and tool coatings. A range of somewhat more exotic applications also exists, such as astronomical instrumentation (e.g., ultra-low loss dielectric mirrors and beam splitters in gravitational wave detectors, such as laser interferometer gravitational-wave observatory (LIGO)), gas sensing, medical devices and implants, and accelerator coatings (e.g., coatings for the large hadron collider (LHC), and compact linear collider (CLIC) experiments at European organization for nuclear research (CERN)). This Special Issue will provide a platform for researchers working in any area within this highly diverse field to share and exchange their latest research findings. The Special Issue contains novel studies encompassing material characterisation techniques, a range of thin-film coating deposition processes and applications of such technology.

Technology: general issues --- PECVD --- plasma diagnostics --- nc-Si:H --- RF-PECVD --- Fourier-transform infrared spectroscopy (FTIR) --- quadruple mass spectrometry (QMS) --- optical emission spectroscopy (OES) --- X-ray diffraction spectroscopy (XRD) --- micro hollow glass spheres (MHGS) --- solid micro glass spheres (SMGS) --- liquid phase deposition (LPD) --- aluminum coating --- β-Ga2O3 --- MOCVD --- VI/III ratio --- scandium stabilized zirconia thin films --- e-beam physical vapor deposition --- thin films ceramics --- Raman spectroscopy --- X-ray diffraction --- initiated chemical vapor deposition (iCVD) --- superhydrophobic --- fluoropolymer --- thin film --- atomic layer deposition --- nanomechanics --- Young’s modulus --- shear modulus --- resonant frequency --- Q-factor --- microcantilevers --- internal stress --- nickel–chromium --- thin film thermocouples --- physical vapor deposition --- flat film extrusion --- foil quality --- MgF2 --- color center absorption --- density --- crystal frequency --- stress --- adhesion --- polarization controlling --- dual functional-metalens --- focusing --- splitting --- PVD coatings --- nanoindentation --- brittle cracking --- fracture toughness --- diamond coatings --- residual stresses --- interfacial fatigue strength --- annealing --- milling --- n/a --- Young's modulus --- nickel-chromium

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Today, thin films are near-ubiquitous and are utilised in a very wide range of industrially and scientifically important areas. These include familiar everyday instances such as anti-reflective coatings on ophthalmic lenses, smartphone optics, photovoltaics, decorative, and tool coatings. A range of somewhat more exotic applications also exists, such as astronomical instrumentation (e.g., ultra-low loss dielectric mirrors and beam splitters in gravitational wave detectors, such as laser interferometer gravitational-wave observatory (LIGO)), gas sensing, medical devices and implants, and accelerator coatings (e.g., coatings for the large hadron collider (LHC), and compact linear collider (CLIC) experiments at European organization for nuclear research (CERN)). This Special Issue will provide a platform for researchers working in any area within this highly diverse field to share and exchange their latest research findings. The Special Issue contains novel studies encompassing material characterisation techniques, a range of thin-film coating deposition processes and applications of such technology.

Technology: general issues --- PECVD --- plasma diagnostics --- nc-Si:H --- RF-PECVD --- Fourier-transform infrared spectroscopy (FTIR) --- quadruple mass spectrometry (QMS) --- optical emission spectroscopy (OES) --- X-ray diffraction spectroscopy (XRD) --- micro hollow glass spheres (MHGS) --- solid micro glass spheres (SMGS) --- liquid phase deposition (LPD) --- aluminum coating --- β-Ga2O3 --- MOCVD --- VI/III ratio --- scandium stabilized zirconia thin films --- e-beam physical vapor deposition --- thin films ceramics --- Raman spectroscopy --- X-ray diffraction --- initiated chemical vapor deposition (iCVD) --- superhydrophobic --- fluoropolymer --- thin film --- atomic layer deposition --- nanomechanics --- Young's modulus --- shear modulus --- resonant frequency --- Q-factor --- microcantilevers --- internal stress --- nickel-chromium --- thin film thermocouples --- physical vapor deposition --- flat film extrusion --- foil quality --- MgF2 --- color center absorption --- density --- crystal frequency --- stress --- adhesion --- polarization controlling --- dual functional-metalens --- focusing --- splitting --- PVD coatings --- nanoindentation --- brittle cracking --- fracture toughness --- diamond coatings --- residual stresses --- interfacial fatigue strength --- annealing --- milling --- PECVD --- plasma diagnostics --- nc-Si:H --- RF-PECVD --- Fourier-transform infrared spectroscopy (FTIR) --- quadruple mass spectrometry (QMS) --- optical emission spectroscopy (OES) --- X-ray diffraction spectroscopy (XRD) --- micro hollow glass spheres (MHGS) --- solid micro glass spheres (SMGS) --- liquid phase deposition (LPD) --- aluminum coating --- β-Ga2O3 --- MOCVD --- VI/III ratio --- scandium stabilized zirconia thin films --- e-beam physical vapor deposition --- thin films ceramics --- Raman spectroscopy --- X-ray diffraction --- initiated chemical vapor deposition (iCVD) --- superhydrophobic --- fluoropolymer --- thin film --- atomic layer deposition --- nanomechanics --- Young's modulus --- shear modulus --- resonant frequency --- Q-factor --- microcantilevers --- internal stress --- nickel-chromium --- thin film thermocouples --- physical vapor deposition --- flat film extrusion --- foil quality --- MgF2 --- color center absorption --- density --- crystal frequency --- stress --- adhesion --- polarization controlling --- dual functional-metalens --- focusing --- splitting --- PVD coatings --- nanoindentation --- brittle cracking --- fracture toughness --- diamond coatings --- residual stresses --- interfacial fatigue strength --- annealing --- milling