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This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and pr

Plasma density. --- Plasma generators. --- High temperature plasmas. --- Plasma (Gaz ionisés) --- Générateurs de plasma --- Plasmas chauds --- Densité --- Plasma density --- Plasma generators --- High temperature plasmas --- Plasma (Gaz ionisés) --- Générateurs de plasma --- Densité --- Engineering --- Electronics --- Hot plasmas --- Plasmas, High temperature --- Gases at high temperatures --- Plasma (Ionized gases) --- Magnetohydrodynamic generators --- Plasma devices --- Plasma jets --- Density, Plasma