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Ion bombardment --- Solids --- Materials --- Effect of radiation on --- Analysis --- 543.5 --- Physicochemical methods of analysis --- 543.5 Physicochemical methods of analysis --- Solid state physics --- Transparent solids --- Engineering --- Engineering materials --- Industrial materials --- Engineering design --- Manufacturing processes --- Beams, Ion --- Bombardment, Ion --- Impact, Ion --- Ion beams --- Ion impact --- Ionic bombardment --- Collisions (Nuclear physics) --- Ions --- Ion bombardment - Handbooks, manuals, etc --- Solids - Effect of radiation on - Handbooks, manuals, etc --- Materials - Analysis - Handbooks, manuals, etc
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Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.
Ion implantation. --- Metals --- Finishing. --- Metal finishing --- Finishes and finishing --- Metal-work --- Implantation, Ion --- Ion bombardment --- Ion plating --- Particle acceleration. --- Optical materials. --- Surfaces (Physics). --- Chemistry, Physical organic. --- Particle Acceleration and Detection, Beam Physics. --- Condensed Matter Physics. --- Optical and Electronic Materials. --- Characterization and Evaluation of Materials. --- Physical Chemistry. --- Chemistry, Physical organic --- Chemistry, Organic --- Chemistry, Physical and theoretical --- Physics --- Surface chemistry --- Surfaces (Technology) --- Optics --- Materials --- Particles (Nuclear physics) --- Acceleration (Mechanics) --- Nuclear physics --- Acceleration --- Condensed matter. --- Electronic materials. --- Materials science. --- Physical chemistry. --- Chemistry, Theoretical --- Physical chemistry --- Theoretical chemistry --- Chemistry --- Material science --- Physical sciences --- Electronic materials --- Condensed materials --- Condensed media --- Condensed phase --- Materials, Condensed --- Media, Condensed --- Phase, Condensed --- Liquids --- Matter --- Solids
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Modern technology depends on materials with precisely controlled properties. Ion beams are a favoured method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition to integrated circuit technology, ion beams are used to modify the mechanical, tribological and chemical properties of metal, intermetallic and ceramic materials without altering their bulk properties. Ion-solid interactions are the foundation that underlies the broad application of ion beams to the modification of materials. This text is designed to cover the fundamentals and applications of ion-solid interactions and is aimed at graduate students and researchers interested in electronic devices, surface engineering, reactor and nuclear engineering and material science issues associated with metastable phase synthesis.
Solids --- Ion bombardment. --- Ion implantation --- Effect of radiation on. --- Industrial applications.
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