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Properties of metal silicides
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ISBN: 0852968590 Year: 1995 Publisher: Stevenage IEE

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Silicide thin films - fabrication, properties, and applications
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ISBN: 1558993053 Year: 1996 Publisher: Pittsburgh Materials research society

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RMS 1989 : proceedings of the European workshop on refractory metals and silicides
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Year: 1989 Publisher: Amsterdam North-Holland

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Materials for advanced metallization MAM 2004
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Year: 2004 Publisher: Amsterdam : Elsevier,

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Good practices best practices : highlighting the compound idea of education, creativity, research and practice.
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ISBN: 9789081323857 Year: 2012 Publisher: Gent LUCA

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Dielectric films for advanced microelectronics.
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ISBN: 9780470013601 Year: 2008 Publisher: Chichester Wiley

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Electromigration-induced drift in damascene and plasma-etched al(Cu) : I. kinetics of Cu depletion in polycrystalline interconnects
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Year: 2000 Publisher: [S.l.] American Institute of Physics

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Electromigration-induced drift in damascene and plasma-etched Al (Cu) : II. mass transport mechanics in bamboo interconnects
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Year: 2000 Publisher: [S.l.] American Institute of Physics

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Halfgeleidercomponenten.
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ISBN: 9781112330315 Publisher: Leuven VTK.

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Dissertation
Interactions of implanted dopants and the metal/Si system : fundamental aspects and applications of ion beam mixing and dopant redistribution.
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Year: 1987 Publisher: Leuven KU Leuven. Faculteit Ingenieurswetenschappen

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