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This dissertation explores the reactive high power impulse magnetron sputtering (HiPIMS) of metal oxides, focusing on understanding the fundamental mechanisms and improving film deposition processes. The research investigates the stabilization of HiPIMS processes in the transition zone between metal and compound modes for materials such as Al-O, Ce-O, and Ti-O. It compares these processes with direct current magnetron sputtering (DCMS) and examines the impact of various sputtering conditions. Key findings include the elimination or suppression of the hysteresis effect, leading to stable deposition with higher rates. The study also analyzes the discharge current behavior, ion compositions, and energy distributions, providing insights into film growth and properties. The work aims to demonstrate high-quality metal oxide film growth without feedback control systems and is intended for researchers in plasma coatings and materials science.

Magnetron sputtering. --- Thin films. --- Magnetron sputtering --- Thin films