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Book
Ion implantation technology--1998 : 1998 International Conference on Ion Implantation Technology : Proceedings, Kyoto, Japan, June 22-26, 1998
Authors: --- --- --- ---
Year: 1998 Publisher: [Place of publication not identified] The Institute of Electrical and Electronics Engineers Inc

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Dissertation
Dopant imaging and profiling of wide bandgap semiconductor devices.
Author:
ISBN: 3866281242 Year: 2007 Publisher: Konstanz Hartung-Gorre

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Book
Design of Shallow p-type Dopants in ZnO (Presentation)
Authors: --- --- --- ---
Year: 2008 Publisher: [Place of publication not identified] : Washington, D.C. : United States. Dept. of Energy : Oak Ridge, Tenn. : distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy,

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ZnO is a promising material for short wave-length opto-electronic devices such as UV lasers and LEDs due to its large exciton binding energy and low material cost. ZnO can be doped easily n-type, but the realization of stable p-type ZnO is rather difficult. Using first-principles band structure methods the authors address what causes the p-type doping difficulty in ZnO and how to overcome the p-type doping difficulty in ZnO.


Book
Effects of zinc concentration on output of zinc-doped germanium detectors
Authors: --- ---
Year: 1968 Publisher: Washington, D.C. : National Aeronautics and Space Administration,

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Book
Ion implantation technology /.
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ISBN: 0444821945 Year: 2006 Publisher: New York (N.Y.) AIP

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Book
Design of shallow p-type dopants in ZnO : preprint
Authors: --- --- ---
Year: 2008 Publisher: Golden, Colo. : National Renewable Energy Laboratory,

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Radiation defect engineering
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ISBN: 1281899178 9786611899172 9812703195 9789812703194 9789812565211 9812565213 9812565213 9781281899170 6611899170 Year: 2005 Publisher: New Jersey ; London : World Scientific,

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The increasing complexity of problems in semiconductor electronics and optoelectronics has exposed the insufficient potential of the technological doping processes currently used. One of the most promising techniques, which this book explores, is radiation doping: the intentional, directional modification of the properties of semiconductors under the action of various types of radiation. The authors consider the basic principles of proton interactions with single crystal semiconductors on the basis of both theory as well as practical results. All types of proton modifications of the materials


Book
Carrier density and compensation in semiconductors with multi dopants and multi transition energy levels : the case of Cu impurity in CdTe : preprint
Authors: ---
Year: 2011 Publisher: [Golden, CO] : National Renewable Energy Laboratory,

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Rapid thermal processing
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ISBN: 0931837170 Year: 1986 Publisher: Pittsburgh Materials research society

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Book
Ion implantation technology--96 : proceedings of the Eleventh International Conference on Ion Implantation Technology, Austin, Texas, USA, June 16-21, 1996
Authors: ---
Year: 1996 Publisher: [Place of publication not identified] Institute of Electrical and Electronics Engineers

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