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Semiconductor photocatalysts have attracted a great amount of multidiscipline research due to their high potential for solar-to-chemical-energy conversion applications, ranging from water and air purification to hydrogen and chemical fuel production. This unique diversity of photoinduced applications has spurred major research efforts on the rational design and development of photocatalytic materials with tailored structural, morphological, and optoelectronic properties in order to promote solar-light harvesting, easy photogenerated electron-hole recombination and the concomitant low quantum efficiency. This book presents a collection of original research articles on advanced photocatalytic materials, synthesized by novel fabrication approaches and/or innovative modifications that improve their performance in target photocatalytic applications such as water (cyanobacterial toxins, antibiotics, phenols, and dyes) and air (NOx and volatile organic compounds) pollutant degradation, hydrogen evolution, and hydrogen peroxide production by photoelectrochemical cells.

Technology: general issues --- anatase --- brookite --- C/N-TiO2 --- microcystin-LR --- photodegradation --- visible light --- TiO2 nanomaterials --- Au nanoparticles --- anodization --- photocatalytic degradation of antibiotics --- LC-MS/MS --- TiO2 --- photonic crystals --- graphene oxide nanocolloids --- reduced graphene oxide --- photocatalysis --- photocatalytic materials --- nanocomposites --- sulfate-modified BiVO4 --- methylene blue --- LED visible light --- photodecomposition --- anatase TiO2 nanocrystals --- high-energy facets --- photocatalytic activity --- photovoltaic performance --- photoactive cement --- TiO2/N --- NOx decomposition --- mechanical properties --- plasmonic photocatalysis --- silver-copper oxide --- VOCs remediation --- full-spectrum photoresponse --- carbon-doped titania --- carbon-modified titania --- graphene/titania --- vis-active photocatalyst --- antibacterial properties --- laser pyrolysis --- hydrogen peroxide --- CdS --- CdSe --- photoelectrocatalysis --- photocatalytic fuel cells --- photo fuel cells --- visible light activated titania --- heterojunction photocatalysts --- photonic crystal catalysts --- graphene-based photocatalysts --- water and air purification --- solar fuels

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Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue “Advances in Chemical Vapor Deposition” is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices.

Technology: general issues --- APCVD --- VO2 --- processing parameters --- 2D --- chemical vapor deposition --- atomic layer deposition --- aluminum oxide --- aluminum tri-sec-butoxide --- thin film --- carbon nanotubes --- residual gas adsorption --- residual gas desorption --- field emission --- atmospheric pressure CVD --- low pressure CVD --- hybrid CVD --- aerosol assisted CVD --- pulsed CVD --- perovskite photovoltaic nanomaterials --- stabilization --- structural design --- performance optimization --- solar cells --- anatase single crystals --- process-induced nanostructures --- competitive growth --- pp-MOCVD --- vanadium pentoxide --- electrochromic --- spray pyrolysis --- ammonium metavanadate --- CVD --- electrochromism --- perovskite photovoltaic materials --- TiO2 --- Al2O3 --- V2O5 --- computational fluid dynamics --- APCVD --- VO2 --- processing parameters --- 2D --- chemical vapor deposition --- atomic layer deposition --- aluminum oxide --- aluminum tri-sec-butoxide --- thin film --- carbon nanotubes --- residual gas adsorption --- residual gas desorption --- field emission --- atmospheric pressure CVD --- low pressure CVD --- hybrid CVD --- aerosol assisted CVD --- pulsed CVD --- perovskite photovoltaic nanomaterials --- stabilization --- structural design --- performance optimization --- solar cells --- anatase single crystals --- process-induced nanostructures --- competitive growth --- pp-MOCVD --- vanadium pentoxide --- electrochromic --- spray pyrolysis --- ammonium metavanadate --- CVD --- electrochromism --- perovskite photovoltaic materials --- TiO2 --- Al2O3 --- V2O5 --- computational fluid dynamics

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Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue “Advances in Chemical Vapor Deposition” is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices.

APCVD --- VO2 --- processing parameters --- 2D --- chemical vapor deposition --- atomic layer deposition --- aluminum oxide --- aluminum tri-sec-butoxide --- thin film --- carbon nanotubes --- residual gas adsorption --- residual gas desorption --- field emission --- atmospheric pressure CVD --- low pressure CVD --- hybrid CVD --- aerosol assisted CVD --- pulsed CVD --- perovskite photovoltaic nanomaterials --- stabilization --- structural design --- performance optimization --- solar cells --- anatase single crystals --- process-induced nanostructures --- competitive growth --- pp-MOCVD --- vanadium pentoxide --- electrochromic --- spray pyrolysis --- ammonium metavanadate --- CVD --- electrochromism --- perovskite photovoltaic materials --- TiO2 --- Al2O3 --- V2O5 --- computational fluid dynamics

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Plasma electrolytic oxidation (PEO), also known as micro-arc oxidation (MAO), functionalizes surfaces, improving the mechanical, thermal, and corrosion performance of metallic substrates, along with other tailored properties (e.g., biocompatibility, catalysis, antibacterial response, self-lubrication, etc.). The extensive field of applications of this technique ranges from structural components, in particular, in the transport sector, to more advanced fields, such as bioengineering. The present Special Issue covers the latest advances in PEO‐coated light alloys for structural (Al, Mg) and biomedical applications (Ti, Mg), with 10 research papers and 1 review from leading research groups around the world.

magnesium --- plasma electrolytic oxidation --- SiO2 particle --- corrosion resistance --- wear resistance --- micro arc oxidation (MAO) --- Cu nano-layer --- hydrophilic surface --- apatite --- in vitro bioactivity --- antibacterial properties --- PEO --- LDH --- active protection --- corrosion --- aluminium --- biodegradable implants --- magnesium alloy --- micro-arc oxidation --- Taguchi method --- SBF --- in-vivo test --- biodegradability --- plasma electrolytic oxidation (PEO) --- aluminum 6082 --- luminescent coatings --- phosphorescence --- anodized aluminum --- Mott-Schottky analysis --- defect --- annealing --- titanium dioxide --- anatase and rutile --- surface treatment --- wear --- medical engineering --- aluminum --- titanium --- Al7075 alloy --- aluminum oxide --- molten salt --- microhardness --- radio frequency magnetron sputtering (RFMS) --- calcium-phosphate (CaP) coating --- n/a

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This book focuses on recent advances in plasma technology and its application to metals, alloys, and related materials. Surface modifications, material syntheses, cutting and surface coatings are performed using low-pressure plasma or atmospheric-pressure plasma. The contributions of this book include the discussion of a wide scope of plasma technologies applied to materials. Plasma is a versatile tool that can be applied in many types of material processing. New material processing applications of plasmas and new plasma technologies are being developed rapidly. We hope that this book can contribute new knowledge to the plasma material research society.

Technology: general issues --- cathodic plasma electrolysis deposition --- Al2O3 coating --- oxidation --- solution surface tension --- nitrogen plasma --- Ga droplet --- GaN nanodot --- transmission electron microscopy --- wurtzite --- Zinc-blende --- plasma cutting --- cut heat affected zone --- mini-tensile test --- steel plate --- residual stress --- atmospheric pressure plasma jet --- platinum --- tin oxide --- dye-sensitized solar cells --- chloroplatinic acid --- tin chloride --- self-lubricating --- composite coating --- titanium --- plasma electrolytic oxidation (PEO) --- polytetrafluoroethylene (PTFE) --- plasma nitriding --- atmospheric-pressure plasma --- nitrogen dose amount --- hydrogen fraction --- void --- Ti6Al4V lattice structure --- Ag-doped TiO2 anatase --- spark plasma sintering --- selective laser melting --- additive manufacturing --- antibacterial and photoactivity applications --- aluminum --- surface --- plasma --- nitrogen --- postdischarge --- atmospheric pressure --- wettability --- organic-inorganic halide perovskite --- air plasma --- plasma treatment --- optoelectronic properties --- morphology --- cathodic plasma electrolysis deposition --- Al2O3 coating --- oxidation --- solution surface tension --- nitrogen plasma --- Ga droplet --- GaN nanodot --- transmission electron microscopy --- wurtzite --- Zinc-blende --- plasma cutting --- cut heat affected zone --- mini-tensile test --- steel plate --- residual stress --- atmospheric pressure plasma jet --- platinum --- tin oxide --- dye-sensitized solar cells --- chloroplatinic acid --- tin chloride --- self-lubricating --- composite coating --- titanium --- plasma electrolytic oxidation (PEO) --- polytetrafluoroethylene (PTFE) --- plasma nitriding --- atmospheric-pressure plasma --- nitrogen dose amount --- hydrogen fraction --- void --- Ti6Al4V lattice structure --- Ag-doped TiO2 anatase --- spark plasma sintering --- selective laser melting --- additive manufacturing --- antibacterial and photoactivity applications --- aluminum --- surface --- plasma --- nitrogen --- postdischarge --- atmospheric pressure --- wettability --- organic-inorganic halide perovskite --- air plasma --- plasma treatment --- optoelectronic properties --- morphology