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This dissertation by Laurent Souqui explores the chemical vapor deposition (CVD) of B-C-N materials using organoboron compounds. It focuses on the development and understanding of sp2-BN, BxC, and BCxNy thin films. The research investigates alternative precursors like trimethylboron (TMB) and examines the gas phase and surface chemistries involved. The study covers deposition techniques, including plasma CVD, and evaluates substrate materials such as silicon and zirconium diboride. Findings highlight the potential for high aspect ratio deposition and the impact of various conditions on film growth and morphology. The work is aimed at advancing material science for applications in electronics and UV light emission.

Chemical vapor deposition. --- Boron compounds.