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The book discusses the experimental and theoretical studies related to a thin film deposition technique called high power impulse magnetron sputtering (HiPIMS). It delves into the plasma properties and their influence on the coating. The book further explores the dynamics of the charged species and their effect on thin film growth in the HiPIMS process. It also investigates the energy flux and the complete discharge regime. Using the results and ideas from the fundamental plasma, the book maps out different coating improvements, the concept of sideways deposition of thin films, and the densification process of thin films using HiPIMS.

Thin Films. --- Magnetron Sputtering.