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2008 (4)

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Book
Reactive sputter deposition
Authors: ---
ISBN: 1281512788 9786611512781 3540766642 3540766626 3642095364 9783540766629 Year: 2008 Publisher: Berlin: Springer,

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Abstract

The use of thin films is continuously expanding. In the family of Physical Vapour Deposition techniques, sputtering is one of the most important over the past 40 years. In this book, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to: - start with reactive magnetron sputtering - understand and investigate the technique - control their sputtering process - tune their existing process, obtaining the desired thin films.


Digital
Reactive sputter deposition
Authors: ---
ISBN: 9783540766643 Year: 2008 Publisher: Berlin, Heidelberg Springer-Verlag Berlin Heidelberg

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Book
Reactive Sputter Deposition
Authors: --- ---
ISBN: 9783540766629 9783540766643 Year: 2008 Publisher: Berlin Heidelberg Springer Berlin Heidelberg

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Abstract

The use of thin films is continuously expanding. In the family of Physical Vapour Deposition techniques, sputtering is one of the most important over the past 40 years. In this book, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to: - start with reactive magnetron sputtering - understand and investigate the technique - control their sputtering process - tune their existing process, obtaining the desired thin films.

Keywords


Book
ICTF-14 & RSD2008
Authors: --- ---
ISBN: 9789033473470 Year: 2008 Publisher: [Gent : UGent. Faculteit Wetenschappen,

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Keywords

ICTF. --- Thin films.

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