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This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material). The editor has composed five separate, thematic volumes on thin films of metals, semimetals, glasses, ceramics, alloys, organics, diamonds, graphites, porous materials, noncrystalline solids, supramolecules, polymers, copolymers, biopolymers, composites, blends, activated carbons, intermetallics, chalcogenides, dyes, pigments, nanostructured materials, biomaterials, inorganic/polymer composites, organocer

Thin films --- Films, Thin --- Solid film --- Solid state electronics --- Solids --- Surfaces (Technology) --- Coatings --- Thick films

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The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition.This second edition explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of submicron dimensions. The book covers PVD, laser and E-beam assisted deposition, MBE, and ion beam methods to bring together all of the physical vapor deposition techniques. The book also includes coverage of chemical mechanical polishing that helps attain the flatness that is required by modern lithography methods and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

Chemical vapor deposition --- Thin film devices --- Thin films --- Films, Thin --- Solid film --- Solid state electronics --- Solids --- Surfaces (Technology) --- Coatings --- Thick films --- Devices, Thin film --- Electronic apparatus and appliances --- CVD (Chemical vapor deposition) --- Deposition, Chemical vapor --- Vapor deposition, Chemical --- Vapor-plating --- Design and construction --- Engineering --- Electronics

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A compendium representing the current state of the art in the modelling, simulation and physics of the interaction of hydrogen and helium with plasma facing materials in fusion reactors. This is the topic that will determine the success of the production of energy by future Tokamak reactors and it is here discussed by the world's experts. Topics covered are recycling of hydrogen isotopes; wall fuelling and wall pumping; active control of hydrogen recycling; hydrogen and helium behaviour in solids and liquid metals; and databases for recycling.

Plasma (Ionized gases) --- Hydrogen --- Helium --- Fusion reactors --- Physics --- Physical Sciences & Mathematics --- Electricity & Magnetism --- Isotopes --- Plasma (Gaz ionisés) --- Hydrogène --- Hélium --- Réacteurs à fusion --- Congresses --- Congresses. --- Congrès --- Monograph --- Materials—Surfaces. --- Thin films. --- Physical chemistry. --- Mathematical physics. --- Chemometrics. --- Surfaces and Interfaces, Thin Films. --- Physical Chemistry. --- Theoretical, Mathematical and Computational Physics. --- Math. Applications in Chemistry. --- Films, Thin --- Solid film --- Solid state electronics --- Solids --- Surfaces (Technology) --- Coatings --- Thick films --- Chemistry, Analytic --- Analytical chemistry --- Chemistry --- Chemistry, Theoretical --- Physical chemistry --- Theoretical chemistry --- Physical mathematics --- Mathematics --- Measurement --- Statistical methods

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In the modern semiconductor industry, there is a growing need to understand and combat potential radiation damage problems. Space applications are an obvious case, but, beyond that, today's device and circuit fabrication rely on increasing numbers of processing steps that involve an aggressive environment where inadvertant radiation damage can occur. This book is both aimed at post-graduate researchers seeking an overview of the field, and will also be immensely useful for nuclear and space engineers and even process engineers. A background knowledge of semiconductor and device physics is assumed, but the basic concepts are all briefly summarized. Finally the book outlines the shortcomings of present experimental and modeling techniques and gives an outlook on future developments.

Semiconductors --- Effect of radiation on. --- -Crystalline semiconductors --- Semi-conductors --- Semiconducting materials --- Semiconductor devices --- Crystals --- Electrical engineering --- Electronics --- Solid state electronics --- Effect of radiation on --- Materials --- -Effect of radiation on --- Semiconductors, Effect of radiation on --- Crystallography. --- Energy policy. --- Energy and state. --- Optics. --- Electrodynamics. --- Materials science. --- Optical materials. --- Electronic materials. --- Materials—Surfaces. --- Thin films. --- Crystallography and Scattering Methods. --- Energy Policy, Economics and Management. --- Classical Electrodynamics. --- Characterization and Evaluation of Materials. --- Optical and Electronic Materials. --- Surfaces and Interfaces, Thin Films. --- Films, Thin --- Solid film --- Solids --- Surfaces (Technology) --- Coatings --- Thick films --- Electronic materials --- Optics --- Material science --- Physical sciences --- Dynamics --- Physics --- Light --- Energy and state --- Power resources --- State and energy --- Industrial policy --- Energy conservation --- Leptology --- Mineralogy --- Government policy