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High-temperature superconductors
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ISBN: 0931837677 9780931837678 Year: 1988 Volume: 99 Publisher: Pittsburgh Materials research society

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Crystal chemistry of high-Tc superconducting copper oxides
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ISBN: 3540515453 0387515453 3642838944 3642838928 9780387515458 Year: 1991 Volume: 15 Publisher: Berlin Springer

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New horizons in low-dimensional electron systems: a Festschrift in honour of H. Kamimura
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ISBN: 079231302X 940105407X 9401131902 9780792313021 Year: 1992 Volume: 13 Publisher: Dordrecht Kluwer

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High temperature coatings
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ISBN: 1280752106 9786610752102 0080469558 0750682523 0128047437 9780750682527 9780080469553 9780128047439 9780128046227 0128046228 Year: 2018 Publisher: Oxford: Butterworth-Heinemann,

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High Temperature Coatings demonstrates how to counteract the thermal effects of the rapid corrosion and degradation of exposed materials and equipment that can occur under high operating temperatures. This is the first true practical guide on the use of thermally-protective coatings for high-temperature applications, including the latest developments in materials used for protective coatings. It covers the make-up and behavior of such materials under thermal stress and the methods used for applying them to specific types of substrates, as well as invaluable advice on inspection and repair of e

High density plasma sources : design, physics, and performance
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ISBN: 0815513771 008094616X 9786612253218 9786612755088 1282755080 0815517890 1282253212 1591240638 9781591240631 9780815513773 9780080946160 9780815517887 0815517882 9780815517894 9781282755086 6612755083 9781282253216 6612253215 9780815517894 Year: 1995 Publisher: Park Ridge, N.J. : Noyes Publications,

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This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and pr

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