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Today, thin films are near-ubiquitous and are utilised in a very wide range of industrially and scientifically important areas. These include familiar everyday instances such as anti-reflective coatings on ophthalmic lenses, smartphone optics, photovoltaics, decorative, and tool coatings. A range of somewhat more exotic applications also exists, such as astronomical instrumentation (e.g., ultra-low loss dielectric mirrors and beam splitters in gravitational wave detectors, such as laser interferometer gravitational-wave observatory (LIGO)), gas sensing, medical devices and implants, and accelerator coatings (e.g., coatings for the large hadron collider (LHC), and compact linear collider (CLIC) experiments at European organization for nuclear research (CERN)). This Special Issue will provide a platform for researchers working in any area within this highly diverse field to share and exchange their latest research findings. The Special Issue contains novel studies encompassing material characterisation techniques, a range of thin-film coating deposition processes and applications of such technology.

Technology: general issues --- PECVD --- plasma diagnostics --- nc-Si:H --- RF-PECVD --- Fourier-transform infrared spectroscopy (FTIR) --- quadruple mass spectrometry (QMS) --- optical emission spectroscopy (OES) --- X-ray diffraction spectroscopy (XRD) --- micro hollow glass spheres (MHGS) --- solid micro glass spheres (SMGS) --- liquid phase deposition (LPD) --- aluminum coating --- β-Ga2O3 --- MOCVD --- VI/III ratio --- scandium stabilized zirconia thin films --- e-beam physical vapor deposition --- thin films ceramics --- Raman spectroscopy --- X-ray diffraction --- initiated chemical vapor deposition (iCVD) --- superhydrophobic --- fluoropolymer --- thin film --- atomic layer deposition --- nanomechanics --- Young's modulus --- shear modulus --- resonant frequency --- Q-factor --- microcantilevers --- internal stress --- nickel-chromium --- thin film thermocouples --- physical vapor deposition --- flat film extrusion --- foil quality --- MgF2 --- color center absorption --- density --- crystal frequency --- stress --- adhesion --- polarization controlling --- dual functional-metalens --- focusing --- splitting --- PVD coatings --- nanoindentation --- brittle cracking --- fracture toughness --- diamond coatings --- residual stresses --- interfacial fatigue strength --- annealing --- milling --- PECVD --- plasma diagnostics --- nc-Si:H --- RF-PECVD --- Fourier-transform infrared spectroscopy (FTIR) --- quadruple mass spectrometry (QMS) --- optical emission spectroscopy (OES) --- X-ray diffraction spectroscopy (XRD) --- micro hollow glass spheres (MHGS) --- solid micro glass spheres (SMGS) --- liquid phase deposition (LPD) --- aluminum coating --- β-Ga2O3 --- MOCVD --- VI/III ratio --- scandium stabilized zirconia thin films --- e-beam physical vapor deposition --- thin films ceramics --- Raman spectroscopy --- X-ray diffraction --- initiated chemical vapor deposition (iCVD) --- superhydrophobic --- fluoropolymer --- thin film --- atomic layer deposition --- nanomechanics --- Young's modulus --- shear modulus --- resonant frequency --- Q-factor --- microcantilevers --- internal stress --- nickel-chromium --- thin film thermocouples --- physical vapor deposition --- flat film extrusion --- foil quality --- MgF2 --- color center absorption --- density --- crystal frequency --- stress --- adhesion --- polarization controlling --- dual functional-metalens --- focusing --- splitting --- PVD coatings --- nanoindentation --- brittle cracking --- fracture toughness --- diamond coatings --- residual stresses --- interfacial fatigue strength --- annealing --- milling