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book (9)


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English (9)


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Book
Electronic and photonic applications of polymers
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ISBN: 0841224005 Year: 1988 Publisher: Washington, DC : American Chemical Society,

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Book
Polymers in microlithography : materials and processes
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ISBN: 0841212686 Year: 1989 Publisher: Washington, District of Columbia : American Chemical Society,

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Book
Materials for microlithography : radiation-sensitive polymers
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ISBN: 0841210942 Year: 1984 Publisher: Washington, District of Columbia : American Chemical Society,

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Book
Micro- and nanopatterning polymers
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ISSN: 00976156 ISBN: 0841216886 Year: 1998 Volume: 706 Publisher: Washington, District of Columbia : American Chemical Society,

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Book
Microelectronics technology : polymers for advanced imaging and packaging

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Book
Polymers for high technology : electronics and photonics
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ISBN: 0841211892 Year: 1987 Publisher: Washington, District of Columbia : American Chemical Society,

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Book
Introduction to microlithography : theory, materials, and processing
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ISBN: 0841210403 Year: 1983 Publisher: Washington, District of Columbia : American Chemical Society,

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Non-silver photographic processes : proceedings of the Symposium on Non-silver Photographic Processes held at New College, Oxford, September, 1973
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ISBN: 0121944409 Year: 1975 Publisher: London,New York : Published for the Scientific and Technical Group of the Royal Photographic Society by Academic Press,


Book
Design for Manufacturability with Advanced Lithography
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ISBN: 3319203843 3319203851 Year: 2016 Publisher: Cham : Springer International Publishing : Imprint: Springer,

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This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).  The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography.  Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography.

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