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Book
Submicron lithography
Authors: --- --- ---
ISBN: 0892523689 Year: 1982 Publisher: Bellingham (Wash.) : International Society for Optical Engineering,

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Book
Electronic and photonic applications of polymers : developed from a symposium, 192nd meeting of the American Chemical Society, Anaheim, September 7-12, 1986
Authors: --- ---
ISBN: 084121400X Year: 1988 Volume: vol 218


Book
Semiconductor lithography : principles, practices, and materials
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ISBN: 0306421852 1461282284 1461308852 9780306421853 Year: 1988 Volume: vol *4 Publisher: New York: Plenum,


Book
Design for Manufacturability with Advanced Lithography
Authors: ---
ISBN: 3319203843 3319203851 Year: 2016 Publisher: Cham : Springer International Publishing : Imprint: Springer,

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This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).  The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography.  Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography.

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