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Book
Antimony : characteristics, compounds and applications
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ISBN: 1621006514 1621005984 9781621006510 9781621005988 Year: 2012 Publisher: New York : Nova Science Publishers,

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Germanium
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ISBN: 9781624175282 1624175287 9781612092058 1612092055 Year: 2012 Publisher: New York

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Germanium-based technologies : from materials to devices
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ISBN: 9780080449531 0080449530 9786611003470 1281003476 008047490X 9780080474908 9781281003478 6611003479 Year: 2007 Publisher: Amsterdam Elsevier

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Germanium is a semiconductor material that formed the basis for the development of transistor technology. Although the breakthrough of planar technology and integrated circuits put silicon in the foreground, in recent years there has been a renewed interest in germanium, which has been triggered by its strong potential for deep submicron (sub 45 nm) technologies. Germanium-Based technologies: From Materials to Devices is the first book to provide a broad, in-depth coverage of the field, including recent advances in Ge-technology and the fundamentals in material science, device physics a


Book
Germanium
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ISBN: 1629481815 9781629481814 9781629481807 1629481807 9781629481814 Year: 2013 Publisher: New York

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Germanium is a relatively scarce element found in the Earth's crust at a concentration of 0.007% in the form of bromides, chlorides, fluorides, iodides, hydrides, oxides, selenides, sulfides and telurides. It occurs mostly as germanium oxide (GeO2) and germanium tetrachloride (GeCl4). Germanium is widely used as a component in electronic and optical devices and has found several applications in metallurgy, chemotherapy, nanotechnology and catalysis. In this book, the authors present current research in the study of the characteristics, sources and applications of germanium. Topics include meta

Silicon germanium materials & devices : a market & technology overview to 2006
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ISBN: 1281077119 9786611077112 0080541216 1856173968 9781856173964 9780080541211 9781281077110 6611077111 Year: 2002 Publisher: Oxford : Elsevier,

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The first edition of Silicon Germanium Materials & Devices - A Market & Technology Overview to 2006 examines the development of the silicon germanium business over a six-year period 2001 to 2006. It analyses the trends in markets, technologies and industry structure and profiles all the major players. It is specifically aimed at users and manufacturers of substrates, epiwafers, equipment and devices. The analysis includes a competitive assessment of the market of silicon germanium vs. gallium arsenide, indium phosphide vs. other forms of silicon. Silicon Germanium


Book
MIPS and their role in the exchange of metalloids
Authors: ---
ISBN: 1441963146 9786613074430 1441963154 1283074435 Year: 2010 Publisher: New York, N.Y. : Austin, Tex. : Springer Science+Business Media ; Landes Bioscience,

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Sixteen years have passed since human aquaporin-1 (AQP1) was discovered as the first water channel, facilitating trans-membrane water fluxes. Subsequent years of research showed that the water channel AQP1 was only the tip of an iceberg; the iceberg itself being the ubiquitous super family of membrane intrinsic proteins (MIPs) that facilitate trans-membrane transport of water and an increasing number of small, water-soluble and uncharged compounds. Here we introduce you to the superfamily of MIPs and provide a summary about our gradually refined understanding of the phylogenetic relationship of its members. This volume is dedicated to the metalloids, a recently discovered group of substrates for a number of specific MIPs in a diverse spectrum of organisms. Particular focus is given to the essential boron, the beneficial silicon and the highly toxic arsenic. The respective MIP isoforms that facilitate the transport of these metalloids include members from several clades of the phylogenetic tree, suggesting that metalloid transport is an ancient function within this family of channel proteins. Among all the various substrates that have been shown to be transported by MIPs, metalloids take an outstanding position. While water transport seems to be a common function of many MIPs, single isoforms in plants have been identified as being crucially important for the uptake of boric acid as well as silicic acid. Here, the function seems not to be redundant, as mutations in those genes render plants deficient in boron and silicon, respectively.


Book
Advances in Topological Materials
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Year: 2022 Publisher: MDPI - Multidisciplinary Digital Publishing Institute

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The present collection of articles focuses on different aspects of topological-materials studies. Recent progress in both, theoretical and experimental, studies is covered in this Special Issue. A particular stress is given on different optical investigations, as well as on recent band-structure calculations. Besides, neutron scattering experiments, crystal growth, and a number of theoretical models for different topological systems are discussed.


Book
Extended defects in germanium : fundamental and technological aspects
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ISBN: 3540856110 3642099211 9786611950958 1281950955 3540856145 Year: 2009 Publisher: Berlin ; Heidelberg : Springer-Verlag,

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The aim is to give an overview of the physics of extended defects in Germanium, i.e. dislocations (line defects), grain boundaries, stacking faults, twins and {311} defects (two-dimensional defects) and precipitates, bubbles, etc. The first part covers fundamentals, describing the crystallographic structure and other physical and electrical properties, mainly of dislocations. Since dislocations are essential for the plastic deformation of Germanium, methods for analysis and imaging of dislocations and to evaluate their structure are described. Attention is given to the electrical and optical properties, which are important for devices made in dislocated Ge. The second part treats the creation of extended defects during wafer and device processing. Issues are addressed such as defect formation during ion implantation, necessary to create junctions, which are an essential part in every device type. Extended defects are also created during the deposition of thin or thick epitaxial layers on other substrates, which are important for optoelectronic and photovoltaic applications. In brief, the book is intended to provide a fundamental understanding of the extended-defect formation during Ge materials and device processing, providing ways to distinguish harmful from less detrimental defects and should point out ways for defect engineering and control.


Book
The Source/Drain Engineering of Nanoscale Germanium-based MOS Devices
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ISBN: 366249681X 3662496836 Year: 2016 Publisher: Berlin, Heidelberg : Springer Berlin Heidelberg : Imprint: Springer,

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This book mainly focuses on reducing the high parasitic resistance in the source/drain of germanium nMOSFET. With adopting of the Implantation After Germanide (IAG) technique, P and Sb co-implantation technique and Multiple Implantation and Multiple Annealing (MIMA) technique, the electron Schottky barrier height of NiGe/Ge contact is modulated to 0.1eV, the thermal stability of NiGe is improved to 600℃ and the contact resistivity of metal/n-Ge contact is drastically reduced to 3.8×10−7Ω•cm2, respectively. Besides, a reduced source/drain parasitic resistance is demonstrated in the fabricated Ge nMOSFET. Readers will find useful information about the source/drain engineering technique for high-performance CMOS devices at future technology node.


Book
The handbook on optical constants of metals : in tables and figures.
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ISBN: 1621986594 9814405957 9781621986591 9789814405959 9789814405942 9814405949 Year: 2012 Publisher: Hackensack (N.J.) World scientific

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This book presents data on the optical constants of metal elements (Na, Au, Mg, Hg, Sc, Al, Ti, ß-Sn, V, Cr, Mn, Fe, La, Th, etc.) semimetal elements (graphite, Sb, etc.), metallic compounds (TiN, VC, TiSi 2 , CoSi 2 , etc.) and high-temperature superconducting materials (YBa 2 Cu 3 O 7-d , MgB 2 , etc.). A complete set of the optical constants are presented in tabular and graphical forms over the entire photon-energy range. They are: the complex dielectric constant e( E )=e 1 ( E )+ie 2 ( E ), the complex refractive index n *( E )= n ( E )+i k ( E ), the absorption coefficient a( E ) and the

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