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Molecular beam epitaxy. --- Semiconductors --- Materials. --- Epitaxy --- Molecular beams

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Owing to their unique characteristics, direct wide bandgap energy, large breakdown field, and excellent electron transport properties, including operation at high temperature environments and low sensitivity to ionizing radiation, gallium nitride (GaN) and related group III-nitride heterostructures proved to be enabling materials for advanced optoelectronic and electronic devices and systems. Today, they are widely used in high performing short wavelength light emitting diodes (LEDs) and laser diodes (LDs), high performing radar, wireless telecommunications, as well ‘green’ power electronics. Impressive progress in GaN technology over the last 25 years has been driven by a continuously growing need for more advanced systems, and still new challenges arise and need to be solved. Actually, lighting industry, RF defene industry, and 5G mmWave telecommunication systems are driving forces for further intense research in order to reach full potential of GaN-based semiconductors. In the literature, there is a number of review papers and publications reporting technology progress and indicating future trends. In this Special Issue of Electronics, eight papers are published, the majority of them focusing materials and process technology of GaN-based devices fabricated on native GaN substrates. The specific topics include: GaN single crystalline substrates for electronic devices by ammonothermal and HVPE methods, Selective – Area Metalorganic Vapour – Phase Epitaxy of GaN and AlGaN/GaN hetereostructures for HEMTs, Advances in Ion Implantation of GaN and Related Materials including high pressure processing (lattice reconstruction) of ion implanted GaN (Mg and Be) and III-Nitride Nanowires for electronic and optoelectronic devices.

GaN HEMT --- self-heating effect --- microwave power amplifier --- thermal impedance --- thermal time constant --- thermal equivalent circuit --- GaN --- crystal growth --- ammonothermal method --- HVPE --- ion implantation --- gallium nitride --- thermodynamics --- ultra-high-pressure annealing --- diffusion --- diffusion coefficients --- molecular beam epitaxy --- nitrides --- laser diode --- tunnel junction --- LTE --- AlN --- AlGaN/GaN --- interface state density --- conductance-frequency --- MISHEMT --- gallium nitride nanowires --- polarity --- Kelvin probe force microscopy --- selective area growth --- selective epitaxy --- AlGaN/GaN heterostructures --- edge effects --- effective diffusion length --- MOVPE --- nanowires --- AlGaN --- LEDs --- growth polarity --- n/a

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What is the future of CMOS? Sustaining increased transistor densities along the path of Moore's Law has become increasingly challenging with limited power budgets, interconnect bandwidths, and fabrication capabilities. In the last decade alone, transistors have undergone significant design makeovers; from planar transistors of ten years ago, technological advancements have accelerated to today's FinFETs, which hardly resemble their bulky ancestors. FinFETs could potentially take us to the 5-nm node, but what comes after it? From gate-all-around devices to single electron transistors and two-dimensional semiconductors, a torrent of research is being carried out in order to design the next transistor generation, engineer the optimal materials, improve the fabrication technology, and properly model future devices. We invite insight from investigators and scientists in the field to showcase their work in this Special Issue with research papers, short communications, and review articles that focus on trends in micro- and nanotechnology from fundamental research to applications.

MOSFET --- n/a --- total ionizing dose (TID) --- low power consumption --- process simulation --- two-dimensional material --- negative-capacitance --- power consumption --- technology computer aided design (TCAD) --- thin-film transistors (TFTs) --- band-to-band tunneling (BTBT) --- nanowires --- inversion channel --- metal oxide semiconductor field effect transistor (MOSFET) --- spike-timing-dependent plasticity (STDP) --- field effect transistor --- segregation --- systematic variations --- Sentaurus TCAD --- indium selenide --- nanosheets --- technology computer-aided design (TCAD) --- high-? dielectric --- subthreshold bias range --- statistical variations --- fin field effect transistor (FinFET) --- compact models --- non-equilibrium Green’s function --- etching simulation --- highly miniaturized transistor structure --- compact model --- silicon nanowire --- surface potential --- Silicon-Germanium source/drain (SiGe S/D) --- nanowire --- plasma-aided molecular beam epitaxy (MBE) --- phonon scattering --- mobility --- silicon-on-insulator --- drain engineered --- device simulation --- variability --- semi-floating gate --- synaptic transistor --- neuromorphic system --- theoretical model --- CMOS --- ferroelectrics --- tunnel field-effect transistor (TFET) --- SiGe --- metal gate granularity --- buried channel --- ON-state --- bulk NMOS devices --- ambipolar --- piezoelectrics --- tunnel field effect transistor (TFET) --- FinFETs --- polarization --- field-effect transistor --- line edge roughness --- random discrete dopants --- radiation hardened by design (RHBD) --- low energy --- flux calculation --- doping incorporation --- low voltage --- topography simulation --- MOS devices --- low-frequency noise --- high-k --- layout --- level set --- process variations --- subthreshold --- metal gate stack --- electrostatic discharge (ESD) --- non-equilibrium Green's function

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Significant progress has been made in nanophotonics and the use of nanostructured materials for optoelectronic devices, including light-emitting diodes (LEDs) and laser diodes, which have recently attracted considerable attention due to their unique geometry. Nanostructures in small dimensions, comprising nanowires, nanotubes, and nanoparticles, etc,. can be perfectly integrated into a variety of technological platforms, offering novel physical and chemical properties for high-performance, light-emitting devices. This Special Issue aims to present the most recent advances in the field of nanophotonics, which focuses on LEDs and laser diodes. We invite contributions of original research articles, as well as review articles that are aligned to the following topics that include, but are not limited to, thetheoretical calculation, synthesis, characterization, and application of such novel nanostructures for light-emitting devices. The application of nanostructured light-emitters in general lighting, imaging, and displays is also highly encouraged.

Liquid phase deposition method --- InGaN/GaN light-emitting diode --- silver nanoparticle --- zinc oxide --- localized surface plasmon --- β-Ga2O3 --- III-Nitrides --- monoclinic --- hexagonal arrangement --- high-power --- current distribution --- vertical structure LED --- blue organic light emitting diodes --- transport materials --- host-dopant --- nanoparticles --- luminescence --- non-stoichiometric ZnxAgyInS1.5+x+0.5y nanocrystals --- photoluminescence properties --- tunable fluorescence emission --- one-pot approach --- perovskite light-emitting diodes --- three-step spin coating --- hole transport layer --- PEDOT:PSS/MoO3-ammonia composite --- μLED displays --- μLEDs --- GaN nanowires --- core-shell structure --- ultraviolet (UV) emitter --- surface plasmon --- Pt nanoparticles --- hole-pattern --- photon emission efficiency --- distributed Bragg reflectors --- gratings --- GaN-based lasers --- linewidth --- epsilon-near-zero --- wideband absorber --- plasmon mode --- Brewster mode --- visible light communication --- photonic crystals --- flip-chip LED --- Purcell effect --- light extraction efficiency --- nanostructured materials --- surface/interface properties --- nanostructured light-emitting devices --- physical mechanism --- surface/interface modification --- surface/interface control --- micro-scale light emitting diode --- sapphire substrate --- encapsulation --- compound semiconductor --- nanostructure --- ultraviolet --- light-emitting diode (LED) --- molecular beam epitaxy --- GaN --- AlN --- photonic nanojet --- photonic nanojet array --- self-assembly --- template-assisted self-assembly --- patterning efficiency --- III-nitride thin film --- nanostructures --- ultraviolet emitters --- surface passivation --- luminescence intensity --- n/a