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Book
X-ray photoelectron spectroscopy
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ISBN: 1617282405 9781617282409 9781616689155 1616689153 Year: 2011 Publisher: New York

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X-ray photoelectron spectroscopy (XPS) is a quantitative spectroscopic technique that measures the elemental composition, empirical formula, chemical state and electronic state of the elements that exist within a material. XPS spectra are obtained by irradiating a material with a beam of X-rays while simultaneously measuring the kinetic energy (KE) and number of electrons that escape from the top 1 to 10 nm of the material being analyzed. This book reviews research in the field of X-ray photoelectron spectroscopy including: XPS studies from industrial and bioactive glass to biomaterials and


Book
Auger electron spectroscopy
Author:
ISBN: 160650682X 9781606506820 9781606506813 1606506811 Year: 2015 Publisher: New York [New York] (222 East 46th Street, New York, NY 10017)

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Auger electron spectroscopy (AES) is capable of providing elemental composition and, in some restricted cases, chemical bonding information for the elements present near the surface of solid materials. The surface specificity of this technique is such that only atoms in the top 5 to 10 nm are detected. The great strength of AES is its ability to provide this information with excellent spatial resolution (down to <10 nm). It can be used to provide elemental maps of the surface, which gives rise to the term scanning Auger microscopy (SAM). When used in combination with a source of high-energy ions, it provides elemental depth profiles to depths of up to a few micrometers. The use of AES and SAM for the characterization of a wide range of technological materials is discussed. These include metals and alloys, semiconductors, nanostructures, and insulators. Its value as a tool for high- resolution elemental imaging and compositional depth profiling is illustrated. The application of the technique for obtaining compositional information from the surfaces, interfaces, and thin film structures of technological and engineering materials is demonstrated. This volume also describes the basic physical principles of AES in simple, largely qualitative, terms understandable by any undergraduate science or engineering student. Major components of typical Auger spectrometers are also described because an understanding of the instrumentation is important to anyone wishing to become a skilled analyst. Mention is also made of other types of analysis for which an Auger electron spectrometer may be used, for example, secondary electron microscopy, backscattered electron imaging, and X-ray spectroscopy. The relationship between AES and other analysis techniques is also discussed.

Electronic and photoelectron spectroscopy
Authors: --- ---
ISBN: 9781139165037 9780521817370 9780521520638 0511080530 9780511080531 051107901X 9780511079016 051107977X 9780511079771 1139165038 0521817374 0521520630 1107134943 0511206569 0511561822 Year: 2005 Publisher: Cambridge, UK New York Cambridge University Press

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Abstract

Electronic and photoelectron spectroscopy can provide extraordinarily detailed information on the properties of molecules and are in widespread use in the physical and chemical sciences. Applications extend beyond spectroscopy into important areas such as chemical dynamics, kinetics and atmospheric chemistry. This book aims to provide the reader with a firm grounding of the basic principles and experimental techniques employed. The extensive use of case studies effectively illustrates how spectra are assigned and how information can be extracted, communicating the matter in a compelling and instructive manner. Topics covered include laser-induced fluorescence, resonance-enhanced multiphoton ionization, cavity ringdown and ZEKE spectroscopy. The volume is for advanced undergraduate and graduate students taking courses in spectroscopy and will also be useful to anyone encountering electronic and/or photoelectron spectroscopy during their research.


Book
Hard X-ray Photoelectron Spectroscopy (HAXPES)
Author:
ISBN: 3319240412 3319240439 Year: 2016 Publisher: Cham : Springer International Publishing : Imprint: Springer,

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This book provides the first complete and up-to-date summary of the state of the art in HAXPES and motivates readers to harness its powerful capabilities in their own research. The chapters are written by experts. They include historical work, modern instrumentation, theory and applications. This book spans from physics to chemistry and materials science and engineering. In consideration of the rapid development of the technique, several chapters include highlights illustrating future opportunities as well.


Book
Auger- and x-ray photoelectron spectroscopy in materials science : a user-oriented guide
Author:
ISBN: 3642273807 3642431739 3642273815 Year: 2012 Volume: 49 Publisher: Berlin ; Heidelberg : Springer,

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To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.  .

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