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This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).  The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography.  Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography.

Electrical Engineering --- Electrical & Computer Engineering --- Engineering & Applied Sciences --- Integrated circuits --- Photoresists. --- Lithography. --- Design and construction. --- Photoresist --- Resists, Photosensitive --- Lithographs --- Microelectronics --- Masks (Electronics) --- Photolithography --- Prints --- Systems engineering. --- Computer science. --- Electronics. --- Circuits and Systems. --- Processor Architectures. --- Electronics and Microelectronics, Instrumentation. --- Informatics --- Science --- Engineering systems --- System engineering --- Engineering --- Industrial engineering --- System analysis --- Electrical engineering --- Physical sciences --- Design and construction --- Electronic circuits. --- Microprocessors. --- Microelectronics. --- Microminiature electronic equipment --- Microminiaturization (Electronics) --- Electronics --- Microtechnology --- Semiconductors --- Miniature electronic equipment --- Minicomputers --- Electron-tube circuits --- Electric circuits --- Electron tubes