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Auger electron spectroscopy (AES) is capable of providing elemental composition and, in some restricted cases, chemical bonding information for the elements present near the surface of solid materials. The surface specificity of this technique is such that only atoms in the top 5 to 10 nm are detected. The great strength of AES is its ability to provide this information with excellent spatial resolution (down to <10 nm). It can be used to provide elemental maps of the surface, which gives rise to the term scanning Auger microscopy (SAM). When used in combination with a source of high-energy ions, it provides elemental depth profiles to depths of up to a few micrometers. The use of AES and SAM for the characterization of a wide range of technological materials is discussed. These include metals and alloys, semiconductors, nanostructures, and insulators. Its value as a tool for high- resolution elemental imaging and compositional depth profiling is illustrated. The application of the technique for obtaining compositional information from the surfaces, interfaces, and thin film structures of technological and engineering materials is demonstrated. This volume also describes the basic physical principles of AES in simple, largely qualitative, terms understandable by any undergraduate science or engineering student. Major components of typical Auger spectrometers are also described because an understanding of the instrumentation is important to anyone wishing to become a skilled analyst. Mention is also made of other types of analysis for which an Auger electron spectrometer may be used, for example, secondary electron microscopy, backscattered electron imaging, and X-ray spectroscopy. The relationship between AES and other analysis techniques is also discussed.

Electron spectroscopy. --- Electron spectroscopy for chemical analysis --- ESCA --- Electrons --- X-rays --- Emission

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X-ray photoelectron spectroscopy (XPS) is a quantitative spectroscopic technique that measures the elemental composition, empirical formula, chemical state and electronic state of the elements that exist within a material. XPS spectra are obtained by irradiating a material with a beam of X-rays while simultaneously measuring the kinetic energy (KE) and number of electrons that escape from the top 1 to 10 nm of the material being analyzed. This book reviews research in the field of X-ray photoelectron spectroscopy including: XPS studies from industrial and bioactive glass to biomaterials and

X-ray photoelectron spectroscopy. --- Electron spectroscopy for chemical analysis --- ESCA (Electron spectroscopy for chemical analysis) --- XPS (X-ray photoelectron spectroscopy) --- Photoelectron spectroscopy

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Handbook of Mineral Spectroscopy, Volume Two: Infrared Spectra, a Four Volume Set presents a database of Infrared spectra, showing both full spectra and high-resolution spectral regions with band component analyses of rock-forming and major ore minerals. IR of minerals is a very powerful technique for analyzing the different vibrational modes of minerals (in particular functional groups) but also the local environment of atoms in a crystal structure. The book includes a section on silicates and one on non-silicates, subdivided according to the normal mineral classes.

Photoelectron spectroscopy. --- Spectroscopy, Photoelectron --- Electron spectroscopy --- Molecular orbitals --- Molecular spectra --- Molecular spectroscopy --- Photoelectricity --- Spectrum analysis --- Infrared spectroscopy. --- Mineralogy --- Analysis.

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The second edition of Internal Photoemission Spectroscopy thoroughly updates this vital, practical guide to internal photoemission (IPE) phenomena and measurements. The book's discussion of fundamental physical and technical aspects of IPE spectroscopic applications is supplemented by an extended overview of recent experimental results in swiftly advancing research fields. These include the development of insulating materials for advanced SiMOS technology, metal gate materials, development of heterostructures based on high-mobility semiconductors, and more. Recent results concerning

Photoelectron spectroscopy. --- Photoemission. --- Semiconductors -- Junctions. --- Photoelectron spectroscopy --- Photoemission --- Semiconductors --- Chemistry --- Physics --- Physical Sciences & Mathematics --- Analytical Chemistry --- Light & Optics --- Junctions --- Junctions. --- Emission, Photoelectric --- External photoelectric effect --- Photoelectric effect, External --- Photoelectric emission --- Electrons --- Photoelectricity --- Junctions, Semiconductor --- Semiconductor interface --- Semiconductor interfaces --- Semiconductor junctions --- Interfaces (Physical sciences) --- Spectroscopy, Photoelectron --- Electron spectroscopy --- Molecular orbitals --- Molecular spectra --- Molecular spectroscopy --- Spectrum analysis --- Emission --- Interfaces

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To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.  .

X-ray photoelectron spectroscopy. --- Auger effect. --- Auger spectroscopy --- Auto-ionization --- Autoionization --- ESCA (Electron spectroscopy for chemical analysis) --- XPS (X-ray photoelectron spectroscopy) --- Physics. --- Solid state physics. --- Spectroscopy. --- Microscopy. --- Materials --- Thin films. --- Solid State Physics. --- Spectroscopy and Microscopy. --- Surfaces and Interfaces, Thin Films. --- Surfaces. --- Films, Thin --- Solid film --- Solid state electronics --- Solids --- Surfaces (Technology) --- Coatings --- Thick films --- Surface phenomena --- Friction --- Surfaces (Physics) --- Tribology --- Analysis, Microscopic --- Light microscopy --- Micrographic analysis --- Microscope and microscopy --- Microscopic analysis --- Optical microscopy --- Optics --- Analysis, Spectrum --- Spectra --- Spectrochemical analysis --- Spectrochemistry --- Spectroscopy --- Chemistry, Analytic --- Interferometry --- Radiation --- Wave-motion, Theory of --- Absorption spectra --- Light --- Spectroscope --- Physics --- Natural philosophy --- Philosophy, Natural --- Physical sciences --- Dynamics --- Surfaces --- Qualitative --- Electron spectroscopy for chemical analysis --- Photoelectron spectroscopy --- Electrons --- Internal conversion (Nuclear physics) --- Ionization --- Nuclear physics --- X-rays --- Scanning Auger electron microscopy --- Surfaces (Physics). --- Surface chemistry --- Materials—Surfaces. --- Spectrometry --- Analytical chemistry