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This book describes the operation of a particular technique for the production of compound semiconductor materials. It describes how the technique works, how it can be used for the growth of particular materials and structures, and the application of these materials for specific devices. It contains not only a fundamental description of the operation of the technique but also contains lists of data useful for the everyday operation of OMVPE reactors. It also offers specific recipes that can be used to produce a wide range of specific materials, structures, and devices.Key Features*
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This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth of diamond CVD. The objective is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experiences researchers, scientists, and engineers in academia and industry with the latest developments in this growing field.
Solid state physics --- Diamonds, Artificial. --- Chemical vapor deposition.
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This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
Chemical vapor deposition. --- CVD (Chemical vapor deposition) --- Deposition, Chemical vapor --- Vapor deposition, Chemical --- Vapor-plating --- Physical Sciences --- Engineering and Technology --- Chemistry --- Inorganic Chemistry --- Solid-State Chemistry
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Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
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Chemical vapor deposition --- Decomposition method. --- CVD (Chemical vapor deposition) --- Deposition, Chemical vapor --- Vapor deposition, Chemical --- Vapor-plating --- Method, Decomposition --- Operations research --- Programming (Mathematics) --- System analysis --- Mathematical models.
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Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced.Key Features* Foc
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The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition.This second edition explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of submicron dimensions. The book covers PVD, laser and E-beam assisted deposition, MBE, and ion beam methods to bring together all of the physical vapor deposition techniques. The book also includes coverage of chemical mechanical polishing that helps attain the flatness that is required by modern lithography methods and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
Thin film devices --- Thin films --- Chemical vapor deposition --- Design and construction
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Microelectronics industry. --- Molecular beams --- Microelectronics --- Plasma-enhanced chemical vapor deposition --- Industrial applications. --- Materials. --- Plasma-enhanced CVD --- Microminiature electronic equipment --- Microminiaturization (Electronics) --- Molecular rays --- Positive rays --- Chemical vapor deposition --- Electronics --- Microtechnology --- Semiconductors --- Miniature electronic equipment --- Molecular dynamics --- Electronic industries
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Thin film devices. --- Integrated circuits --- Chemical vapor deposition. --- CVD (Chemical vapor deposition) --- Deposition, Chemical vapor --- Vapor deposition, Chemical --- Vapor-plating --- Devices, Thin film --- Electronic apparatus and appliances --- Thin films --- Design and construction.
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Chemical vapor deposition. --- Nanoparticles. --- Organic compounds --- CVD (Chemical vapor deposition) --- Deposition, Chemical vapor --- Vapor deposition, Chemical --- Vapor-plating --- Nano-particles --- NPs (Nanoparticles) --- Nanoscale particles --- Nanostructured materials --- Particles --- Chemistry, Organic --- Chemistry, Synthetic organic --- Organic synthesis (Chemistry) --- Synthetic organic chemistry --- Synthesis. --- Synthesis
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