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Book
2009 17th International Conference on Advanced Thermal Processing of Semiconductors
Authors: ---
ISBN: 1424438144 1424438152 1424438160 Year: 2009 Publisher: [Place of publication not identified] I E E E

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Book
2022 IEEE 34th International Symposium on Power Semiconductor Devices and ICs (ISPSD)
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ISBN: 1665422017 1665422025 Year: 2022 Publisher: Piscataway, New Jersey : IEEE,

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Abstract

Impurity doping processes in silicon
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ISBN: 0444860959 Year: 1981 Publisher: Amsterdam North-Holland

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Book
IEEE Standard for Exposed Semiconducting Shields on Premolded High Voltage Cable Joints and Separable Insulated Connectors
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ISBN: 073814388X Year: 1977 Publisher: New York : Institute of Electrical and Electronics Engineers (IEEE),

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Cable accessories, specifically separable insulated connectors and cable joints, used with extruded dielectric cable rated above 5 kV, are required to have an outer semiconducting shield covering their insulation surfaces. The shield is intended to protect the insulation, to provide voltage stress relief, to maintain the accessory surface at or near ground potential under normal operating conditions, and to initiate fault current arcing if accessory insulation should fail. This standard sets forth tests and requirements to demonstrate that the shield will perform these duties. One of the requirements in this standard specifies a maximum shield resistance. This requirement is to assure that the accessory shield provides stress relief and that the shield surface is maintained at or near ground potential. Another requirement in this standard specifies a shield fault current initiation test. This test is designed to demonstrate the ability of the accessory shield to initiate fault current arcs to ground which will cause overcurrent protective devices to operate should the accessory insulation fail.


Book
IIT 2002 proceedings : ion implementation technology : 2002 14th International Conference on Ion Implantation Technology proceedings, Taos, New Mexico, USA, 22-27 September 2002
Authors: --- ---
Year: 2002 Publisher: [Place of publication not identified] IEEE

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Book
Ion implantation technology--1998 : 1998 International Conference on Ion Implantation Technology : Proceedings, Kyoto, Japan, June 22-26, 1998
Authors: --- --- --- ---
Year: 1998 Publisher: [Place of publication not identified] The Institute of Electrical and Electronics Engineers Inc

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Dissertation
Dopant imaging and profiling of wide bandgap semiconductor devices.
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ISBN: 3866281242 Year: 2007 Publisher: Konstanz Hartung-Gorre

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Book
Design of Shallow p-type Dopants in ZnO (Presentation)
Authors: --- --- --- ---
Year: 2008 Publisher: [Place of publication not identified] : Washington, D.C. : United States. Dept. of Energy : Oak Ridge, Tenn. : distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy,

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ZnO is a promising material for short wave-length opto-electronic devices such as UV lasers and LEDs due to its large exciton binding energy and low material cost. ZnO can be doped easily n-type, but the realization of stable p-type ZnO is rather difficult. Using first-principles band structure methods the authors address what causes the p-type doping difficulty in ZnO and how to overcome the p-type doping difficulty in ZnO.


Book
Effects of zinc concentration on output of zinc-doped germanium detectors
Authors: --- ---
Year: 1968 Publisher: Washington, D.C. : National Aeronautics and Space Administration,

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Book
Ion implantation technology /.
Author:
ISBN: 0444821945 Year: 2006 Publisher: New York (N.Y.) AIP

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