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Organometallic vapor-phase epitaxy : theory and practice
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ISBN: 9780126738421 0126738424 9780080538181 0080538185 1281057118 9781281057112 9786611057114 6611057110 Year: 1999 Publisher: San Diego : Academic Press,

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Abstract

This book describes the operation of a particular technique for the production of compound semiconductor materials. It describes how the technique works, how it can be used for the growth of particular materials and structures, and the application of these materials for specific devices. It contains not only a fundamental description of the operation of the technique but also contains lists of data useful for the everyday operation of OMVPE reactors. It also offers specific recipes that can be used to produce a wide range of specific materials, structures, and devices.Key Features*

Plasma deposition of amorphous silicon-based materials.
Author:
ISBN: 012137940X 9786611054106 1281054100 0080539106 9780080539102 9781281054104 9780121379407 Year: 1995 Publisher: Boston Academic press

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Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced.Key Features* Foc

Plasma deposition of amorphous silicon-based materials.
Author:
ISBN: 9780080539102 0080539106 1281054100 9781281054104 9786611054106 9780121379407 012137940X Year: 1995 Publisher: Boston Academic press

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Abstract

Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced.Key Features* Foc

Precursor chemistry of advanced materials : CVD, ALD and nanoparticles
Authors: ---
ISSN: 14366002 ISBN: 9783540016052 9783540314516 3540016058 3540314512 Year: 2005 Volume: 9 Publisher: Heidelberg Springer

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Abstract

Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors.


Periodical
Advanced materials.
Author:
ISSN: 09359648 15214095 Year: 1989 Publisher: Weinheim Wiley-VCH.

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Abstract

Advanced Materials has been bringing you the latest progress in materials science for more than 15 years. Read carefully selected, top-quality reviews, communications, and research news at the cutting edge of the chemistry and physics of functional materials as well as book reviews, product information, interviews, and a conference calendar.


Periodical
Advanced functional materials.
ISSN: 1616301X 16163028 Year: 1992 Publisher: Weinheim Wiley-VCH.

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