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Book
Secondary ion mass spectrometry : an introduction to principles and practices
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ISBN: 9781118480489 1118480481 Year: 2014 Publisher: Hoboken, New Jersey : John Wiley & Sons, Inc.,

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"This is presented in a concise yet comprehensive manner to those wanting to know more about the technique in general as opposed to advanced sample specific procedures/applications".


Book
Handbook of static secondary ion mass spectrometry
Authors: --- ---
ISBN: 0471916277 Year: 1989 Publisher: Chichester [West Sussex] ; New York : J. Wiley,


Book
Handbook of stopping cross-sections for energetic ions in all elements.
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ISBN: 0080216072 9780080216072 Year: 1980 Publisher: New York (N.Y.) Pergamon

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Handbook of range distributions for energetic ions in all elements.
Authors: ---
ISBN: 0080238793 Year: 1980 Publisher: New York (N.Y.) Pergamon

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Book
The structures of binary compounds
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ISBN: 044487478X 1322263582 148329076X 9781483290768 9780444874788 Year: 1989 Publisher: Amsterdam, Netherlands : North-Holland,

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- Up-to-date compilation of the experimental data on the structures of binary compounds by Villars and colleagues. - Coloured structure maps which order the compounds into their respective structural domains and present for the first time the local co-ordination polyhedra for the 150 most frequently occurring structure types, pedagogically very helpful and useful in the search for new materials with a required crystal structure. - Crystal co-ordination formulas: a flexible notation for the interpretation of solid-state structures by chemist Bill Jensen. - Recent important advances in unders


Book
Principles and applications of high-energy ion microbeams
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ISBN: 0852745176 9780852745175 Year: 1987 Publisher: Bristol Hilger

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Book
Ion beam science : solved and unsolved problems : invited lectures presented at a symposium arranged by the Royal Danish Academy of Sciences and Letters, Copenhagen, 1-5 May 2006
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ISSN: 00233323 ISBN: 8773043303 9788773043301 Year: 2006 Volume: 52 Publisher: Copenhagen : Kongelige Danske Videnskabernes Selskab,

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Book
Handbook of ion implantation technology
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ISBN: 0444897356 9780444897350 Year: 1992 Publisher: Amsterdam North-Holland

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Ion implantation is the primary technology which is used in the semiconductor industry to introduce impurities into semiconductors to form devices and VLSI circuits. All VLSI manufacturing includes ion implantation steps. The technology has universal acceptance because of the accuracy of the number of implanted atoms, and the uniformity of the implantation across large semiconductor wafers. This book is a tutorial presentation of the physics, processes, technology and operation of ion implantation. Its purpose is to serve as a teaching manual, a source book of relevant data, and a compilation of comments from some of the world's most experienced practitioners of ion implantation. The primary problems in using ion implantation in VLSI processing are wafer cooling, dielectric charging, particulate contamination and process control. Each of these problems is addressed in a separate chapter. Each section is described from first principles in simple tutorial steps, while keeping the goal of finding answers to the most modern and complex problems in VLSI processing.

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