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periodical (3)


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1988 (2)

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Periodical
IEEE International Conference on Advanced Thermal Processing of Semiconductors : RTP.
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ISSN: 1944026X Year: 2002 Publisher: Piscataway, N.J. : IEEE,

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Periodical
Diffusion and defect data.
ISSN: 10120394 16629779 Year: 1988 Publisher: [Vaduz, Liechtenstein : [Stafa-Zuerich, Switzerland : Sci-Tech Publications, Trans Tech Publications]

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Periodical
Defect and diffusion forum.
ISSN: 10120386 16629507 Year: 1988 Publisher: Aedermannsdorf, Switzerland : Zuerich-Uetikon, Switzerland : Stafa-Zuerich, Switzerland : Trans Tech Publications, Scitec Trans Tech Publications

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Abstract

Defect and Diffusion Forum (DDF) (formerly Part A of ''Diffusion and Defect Data'') is designed to publish up-to-date scientific research and applied aspects in the area of formation and dissemination of defects in solid materials, including the phenomena of diffusion.In addition to the traditional topic of mass diffusion, the journal is open to papers from the area of heat transfer in solids, liquids and gases, materials and substances. All papers are peer-reviewed and edited.

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