TY - BOOK ID - 88206534 TI - Handbook of physical vapor deposition (PVD) processing : film formation, adhesion, surface preparation and contamination control PY - 1998 SN - 1591240794 9781591240792 9780815514220 0815514220 1282002759 9786612002755 0815517637 1282002767 PB - Westwood, NJ : Noyes Publications, DB - UniCat KW - Engineering KW - Electronics KW - Vapor-plating KW - Metals KW - Metallic elements KW - Chemical elements KW - Ores KW - Metallurgy KW - Coating, Vacuum KW - Deposition, Vapor KW - Vacuum coating KW - Vacuum metallizing KW - Vapor deposition KW - Vapor-phase deposition KW - Ion plating KW - Plating KW - Protective coatings KW - Refractory materials KW - Vacuum technology KW - Finishing UR - https://www.unicat.be/uniCat?func=search&query=sysid:88206534 AB - This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum te ER -