TY - BOOK ID - 88203808 TI - Rapid thermal processing for future semiconductor devices PY - 2003 SN - 9780444513397 0444513396 9780080540269 0080540260 9786611019075 1281019070 PB - Amsterdam London Elsevier DB - UniCat KW - Semiconductors KW - Rapid thermal processing KW - Rapid thermal annealing KW - Rapid thermal process KW - Crystalline semiconductors KW - Semi-conductors KW - Semiconducting materials KW - Semiconductor devices KW - Crystals KW - Electrical engineering KW - Electronics KW - Solid state electronics KW - Heat treatment KW - Materials UR - https://www.unicat.be/uniCat?func=search&query=sysid:88203808 AB - This volume is a collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. This symposium is second conference followed the previous successful first International RTP conference held at Hokkaido in 1997. The RTP 2001 covered the latest developments in RTP and other short-time processing continuously aiming to point out the future direction in the Silicon ULSI devices and II-VI, III-V compound semiconductor devices.This book covers the following areas: advanced MOS gate stack, i ER -