TY - BOOK ID - 62649522 TI - Plasma deposition of amorphous silicon-based materials. PY - 1995 SN - 012137940X 9786611054106 1281054100 0080539106 9780080539102 9781281054104 9780121379407 PB - Boston Academic press DB - UniCat KW - Amorphous semiconductors KW - Plasma-enhanced chemical vapor deposition KW - Silicon alloys KW - Plasma-enhanced CVD KW - Noncrystalline semiconductors KW - Design and construction KW - Chemical vapor deposition KW - Polycrystalline semiconductors KW - Semiconductors KW - Silicon alloys. KW - Plasma-enhanced chemical vapor deposition. KW - Design and construction. UR - https://www.unicat.be/uniCat?func=search&query=sysid:62649522 AB - Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced.Key Features* Foc ER -