TY - BOOK ID - 5272071 TI - Principles of plasma discharges and materials processing. AU - Lichtenberg, Allan J. AU - Lieberman, Michael A. PY - 1994 SN - 0471005770 PB - New York (N.Y.) Wiley DB - UniCat KW - Plasma dynamics. KW - Thin films KW - Plasma etching. KW - Plasma chemistry. KW - Plasmas, Dynamique des KW - Couches minces KW - Gravure par plasma KW - Plasmachimie KW - Surfaces. KW - Surfaces KW - Plasma chemistry KW - Plasma dynamics KW - Plasma etching KW - -Films, Thin KW - Solid film KW - Solid state electronics KW - Solids KW - Surfaces (Technology) KW - Coatings KW - Thick films KW - Dry etching KW - Etching KW - Snowplow effect KW - Dynamics KW - Plasma (Ionized gases) KW - Magnetohydrodynamics KW - Chemistry KW - -Surfaces KW - Films, Thin UR - https://www.unicat.be/uniCat?func=search&query=sysid:5272071 AB - ER -