TY - BOOK ID - 5231868 TI - High density plasma sources PY - 1995 SN - 0815513771 008094616X 9786612253218 9786612755088 1282755080 0815517890 1282253212 1591240638 9781591240631 9780815513773 9780080946160 9780815517887 0815517882 9780815517894 9781282755086 6612755083 9781282253216 6612253215 9780815517894 PB - Park Ridge, N.J. Noyes Publications DB - UniCat KW - Plasma density. KW - Plasma generators. KW - High temperature plasmas. KW - Plasma (Gaz ionisés) KW - Générateurs de plasma KW - Plasmas chauds KW - Densité KW - Plasma density KW - Plasma generators KW - High temperature plasmas KW - Plasma (Gaz ionisés) KW - Générateurs de plasma KW - Densité KW - Engineering KW - Electronics KW - Hot plasmas KW - Plasmas, High temperature KW - Gases at high temperatures KW - Plasma (Ionized gases) KW - Magnetohydrodynamic generators KW - Plasma devices KW - Plasma jets KW - Density, Plasma UR - https://www.unicat.be/uniCat?func=search&query=sysid:5231868 AB - This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and pr ER -