TY - BOOK ID - 5014929 TI - Plasma deposited thin films AU - Mort, J. AU - Jansen, Frank PY - 1986 SN - 0849351197 PB - Boca Raton, Fla. : CRC Press, DB - UniCat KW - Thin film devices KW - Vapor-plating KW - Plasma engineering KW - Dispositifs à couches minces KW - Placage en phase vapeur KW - Plasmas, Technique des KW - 533.95 KW - 539.23 KW - Coating, Vacuum KW - Deposition, Vapor KW - Vacuum coating KW - Vacuum metallizing KW - Vapor deposition KW - Vapor-phase deposition KW - Ion plating KW - Plating KW - Protective coatings KW - Refractory materials KW - Vacuum technology KW - Devices, Thin film KW - Electronic apparatus and appliances KW - Thin films KW - Engineering KW - Plasma (Ionized gases) KW - Plasma dynamics KW - Production of thin films KW - 539.23 Production of thin films KW - 533.95 Plasma dynamics KW - Dispositifs à couches minces UR - https://www.unicat.be/uniCat?func=search&query=sysid:5014929 AB - ER -