TY - THES ID - 2943277 TI - A study of gate oxide damage due to the plasma etching process on sub-0.25um technology AU - Cheal Lee, Hean AU - Katholieke Universiteit Leuven PY - 1999 SN - 9056822268 PB - Leuven Katholieke Universiteit Leuven. Faculteit der Toegepaste Wetenschappen DB - UniCat KW - Academic collection KW - 621.9.047 KW - #BIBC:T1999 KW - Chemical and electrochemical working and machining. Etching. Electrolytic machining etc. KW - Theses KW - 621.9.047 Chemical and electrochemical working and machining. Etching. Electrolytic machining etc. UR - https://www.unicat.be/uniCat?func=search&query=sysid:2943277 AB - ER -