TY - BOOK ID - 146066485 TI - Electron beam induced damage in PECVD Si₃N₄ and SiO₂ films on InP AU - Pantic, Dragan M. AU - Lewis Research Center PY - 1990 PB - Cleveland, Ohio : National Aeronautics and Space Administration, Lewis Research Center, DB - UniCat KW - Capacitance-voltage characteristics. KW - Electron beams. KW - Indium phosphides. KW - Irradiation. KW - Phosphorus. KW - Plasmas (physics) KW - Radiation damage. KW - Vapor deposition. UR - https://www.unicat.be/uniCat?func=search&query=sysid:146066485 AB - ER -