TY - BOOK ID - 145244498 TI - Conformal Chemical Vapor Deposition of Boron Carbide Thin Films. PY - 2023 SN - 9789180754545 PB - Linköping : Linkopings Universitet, DB - UniCat KW - Chemical vapor deposition. KW - Boron compounds. UR - https://www.unicat.be/uniCat?func=search&query=sysid:145244498 AB - This thesis by Arun Haridas Choolakkal, presented at Linköping University, explores the development of a chemical vapor deposition (CVD) process for creating conformal boron carbide thin films. These films are particularly useful as neutron converter materials in solid-state neutron detectors. The research utilizes triethylboron (TEB) as a single-source CVD precursor, focusing initially on low reaction rate deposition. Experiments demonstrated highly conformal films at temperatures ≤450°C, with promising results for detector applications. The study further investigates enhancing step coverage at higher temperatures by introducing diffusion additives. The CVD process was validated on carbon nanotube membranes, confirming the potential for even deposition without inducing defects. This work is aimed at advancing materials science for improved detector performance, targeting researchers and professionals in physics and engineering. ER -