TY - BOOK ID - 145226113 TI - Nanoimprint Lithography Technology and Applications PY - 2022 PB - Basel MDPI - Multidisciplinary Digital Publishing Institute DB - UniCat KW - Technology: general issues KW - nanoimprint lithography KW - polymer KW - formulation development KW - surface chemistry KW - click chemistry KW - plasmons KW - Bragg SPPs KW - angle of incidence KW - grating KW - organic solar cell KW - ultraviolet nanoimprint lithography KW - durability KW - anisotropy KW - contact angle KW - line and space KW - high aspect ratio micro-structure KW - roll-to-plate nanoimprint lithography KW - superhydrophobic KW - oleophobic KW - biomimetic surface KW - large-area patterning KW - negligible residual layer KW - partial cavity filling KW - guiding chart KW - defect avoidance KW - hydrodynamic instabilities KW - T-NIL KW - UV-NIL KW - el-UV-NIL KW - el-T-NIL KW - optical planar waveguides KW - roll-to-plate R2P nanoimprinting KW - UV-curable polymers KW - inorganic-organic hybrid polymer KW - optical losses KW - SmartNIL KW - R2R UV-NIL KW - neuronal cell assay KW - nanoimprint lithography (NIL) KW - undercut features KW - master KW - Blu-Ray patterning KW - reactive ion etching KW - biomimetics KW - morpho butterfly KW - nanoimprint lithography KW - polymer KW - formulation development KW - surface chemistry KW - click chemistry KW - plasmons KW - Bragg SPPs KW - angle of incidence KW - grating KW - organic solar cell KW - ultraviolet nanoimprint lithography KW - durability KW - anisotropy KW - contact angle KW - line and space KW - high aspect ratio micro-structure KW - roll-to-plate nanoimprint lithography KW - superhydrophobic KW - oleophobic KW - biomimetic surface KW - large-area patterning KW - negligible residual layer KW - partial cavity filling KW - guiding chart KW - defect avoidance KW - hydrodynamic instabilities KW - T-NIL KW - UV-NIL KW - el-UV-NIL KW - el-T-NIL KW - optical planar waveguides KW - roll-to-plate R2P nanoimprinting KW - UV-curable polymers KW - inorganic-organic hybrid polymer KW - optical losses KW - SmartNIL KW - R2R UV-NIL KW - neuronal cell assay KW - nanoimprint lithography (NIL) KW - undercut features KW - master KW - Blu-Ray patterning KW - reactive ion etching KW - biomimetics KW - morpho butterfly UR - https://www.unicat.be/uniCat?func=search&query=sysid:145226113 AB - Nanoimprint Lithography (NIL) has been an interesting and growing field in recent years since its beginnings in the mid-1990s. During that time, nanoimprinting has undergone significant changes and developments and nowadays is a technology used in R&D labs and industrial production processes around the world. One of the exciting things about nanoimprinting process is its remarkable versatility and the broad range of applications. This reprint includes ten articles, which represent a small glimpse of the challenges and possibilities of this technology. Six contributions deal with nanoimprint processes aiming at specific applications, while the other four papers focus on more general aspects of nanoimprint processes or present novel materials. Several different types of nanoimprint processes are used: plate-to-plate, roll-to-plate, and roll-to-roll. Plate-to-plate NIL here also includes the use of soft and flexible stamps. The application fields in this reprint are broad and can be identified as plasmonics, superhydrophibicity, biomimetics, optics/datacom, and life sciences, showing the broad applicability of nanoimprinting. The sections on the nanoimprint process discuss filling and wetting aspects during nanoimprinting as well as materials for stamps and imprinting. ER -