TY - BOOK ID - 145152780 TI - Micro- and Nano-Fabrication by Metal Assisted Chemical Etching PY - 2021 PB - Basel, Switzerland MDPI - Multidisciplinary Digital Publishing Institute DB - UniCat KW - History of engineering & technology KW - porous silicon KW - Pd nanoparticles-assisted chemical etching KW - etching rate KW - ethanol electrooxidation KW - X-ray diffractive optics KW - zone plate KW - high aspect ratio nanostructures KW - metal-assisted chemical etching KW - electroless deposition KW - Al2O3 nanotube KW - ultra-high aspect ratio KW - gold (Au) metal assisted chemical etching KW - atomic layer deposition KW - anisotropic dry etching KW - silicon cones KW - metal assisted chemical etching KW - transversal pores KW - antireflection KW - black GaAs KW - photon recycling KW - X-ray grating interferometry KW - catalyst KW - silicon KW - gold electroplating KW - magnetically guided metal-assisted chemical etching KW - bulk Si etching KW - curved Si structure KW - catalyst encapsulation KW - porous silicon KW - Pd nanoparticles-assisted chemical etching KW - etching rate KW - ethanol electrooxidation KW - X-ray diffractive optics KW - zone plate KW - high aspect ratio nanostructures KW - metal-assisted chemical etching KW - electroless deposition KW - Al2O3 nanotube KW - ultra-high aspect ratio KW - gold (Au) metal assisted chemical etching KW - atomic layer deposition KW - anisotropic dry etching KW - silicon cones KW - metal assisted chemical etching KW - transversal pores KW - antireflection KW - black GaAs KW - photon recycling KW - X-ray grating interferometry KW - catalyst KW - silicon KW - gold electroplating KW - magnetically guided metal-assisted chemical etching KW - bulk Si etching KW - curved Si structure KW - catalyst encapsulation UR - https://www.unicat.be/uniCat?func=search&query=sysid:145152780 AB - Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates—Si, Ge, poly-Si, GaAs, and SiC—and using different catalysts—Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale—nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications. ER -