TY - BOOK ID - 129681042 TI - Refractory High-Entropy Alloy and Nitride Thin Films. PY - 2022 SN - 9179292860 PB - LinkoĢping : Linkopings Universitet, DB - UniCat KW - Nitrides. KW - Magnetron sputtering. UR - https://www.unicat.be/uniCat?func=search&query=sysid:129681042 AB - This dissertation by Rui Shu investigates the process-structure-property relationships of refractory high-entropy alloys and nitrides, primarily synthesized through magnetron sputtering. The research focuses on understanding the effects of substrate temperature and nitrogen flow on the mechanical, electrical, and corrosion-resistant properties of TiZrNbTaNx nitrides. The study also explores the impact of ion energy and metal substitution on the evolution of high-entropy nitride films. Furthermore, the dissertation examines structural stability and elemental segregation under irradiation, as well as the superconducting properties of these materials. The work is intended for professionals and researchers in materials science, particularly those interested in the development and application of high-entropy materials for advanced coatings and superconductors. ER -