TY - BOOK ID - 128392699 TI - Submicron lithography AU - Blais, Phillip D. AU - International Society for Hybrid Microelectronics. AU - Northern California Microphotomask/Masking Working Group. AU - Materials Research Society. PY - 1982 SN - 0892523689 PB - Bellingham (Wash.) : International Society for Optical Engineering, DB - UniCat KW - Photolithography KW - Photoresists KW - Congresses. UR - https://www.unicat.be/uniCat?func=search&query=sysid:128392699 AB - ER -