TY - BOOK ID - 128160809 TI - Dusty plasmas : physics, chemistry, and technological impacts in plasma processing PY - 1999 SN - 0471973866 PB - Chichester : Wiley, DB - UniCat KW - Dusty plasmas. KW - Plasma (Ionized gases) KW - Plasma chemistry. KW - Plasma engineering. KW - Plasma-enhanced chemical vapor deposition. KW - Industrial applications. UR - https://www.unicat.be/uniCat?func=search&query=sysid:128160809 AB - Dusty Plasmas Physics, Chemistry and Technological Impacts in Plasma Processing Edited by Andre Bouchoule Universite d'Orleans, France Dusty Plasmas gives the reader a thorough overview of current knowledge on many aspects of the subject, from the basic science to technological implications. The basic physics and chemistry of dusty plasmas developed in the first two chapters are complemented by the more practical considerations of diagnostics and technological implications in the two final chapters. The book will be of interest to those already involved in or just discovering dusty plasmas in their research and/or industrial activity.* Physics and Modelling of Dusty Plasmas* Sources and Growth of Particles* Diagnostics of a Dusty Plasma* Technological Impacts of Dusty Plasmas ER -