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Owing to their unique characteristics, direct wide bandgap energy, large breakdown field, and excellent electron transport properties, including operation at high temperature environments and low sensitivity to ionizing radiation, gallium nitride (GaN) and related group III-nitride heterostructures proved to be enabling materials for advanced optoelectronic and electronic devices and systems. Today, they are widely used in high performing short wavelength light emitting diodes (LEDs) and laser diodes (LDs), high performing radar, wireless telecommunications, as well ‘green’ power electronics. Impressive progress in GaN technology over the last 25 years has been driven by a continuously growing need for more advanced systems, and still new challenges arise and need to be solved. Actually, lighting industry, RF defene industry, and 5G mmWave telecommunication systems are driving forces for further intense research in order to reach full potential of GaN-based semiconductors. In the literature, there is a number of review papers and publications reporting technology progress and indicating future trends. In this Special Issue of Electronics, eight papers are published, the majority of them focusing materials and process technology of GaN-based devices fabricated on native GaN substrates. The specific topics include: GaN single crystalline substrates for electronic devices by ammonothermal and HVPE methods, Selective – Area Metalorganic Vapour – Phase Epitaxy of GaN and AlGaN/GaN hetereostructures for HEMTs, Advances in Ion Implantation of GaN and Related Materials including high pressure processing (lattice reconstruction) of ion implanted GaN (Mg and Be) and III-Nitride Nanowires for electronic and optoelectronic devices.

GaN HEMT --- self-heating effect --- microwave power amplifier --- thermal impedance --- thermal time constant --- thermal equivalent circuit --- GaN --- crystal growth --- ammonothermal method --- HVPE --- ion implantation --- gallium nitride --- thermodynamics --- ultra-high-pressure annealing --- diffusion --- diffusion coefficients --- molecular beam epitaxy --- nitrides --- laser diode --- tunnel junction --- LTE --- AlN --- AlGaN/GaN --- interface state density --- conductance-frequency --- MISHEMT --- gallium nitride nanowires --- polarity --- Kelvin probe force microscopy --- selective area growth --- selective epitaxy --- AlGaN/GaN heterostructures --- edge effects --- effective diffusion length --- MOVPE --- nanowires --- AlGaN --- LEDs --- growth polarity --- n/a

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Semiconductor lasers are key components in many optical systems due to their advantages, including their small size, low cost, high efficiency, and low power consumption. It is well-known that semiconductor lasers under external perturbations, such as optical injection, optical feedback, or delayed coupling can exhibit a large variety of complex dynamical behaviors. Nowadays, cutting-edge engineering applications based on the complex dynamics of diode lasers are being conducted in areas, such as optical communications, optical signal processing, encoded communications, neuro-inspired ultra-fast optical computing devices, microwave signal generation, RADAR and LIDAR applications, biomedical imaging, and broadband spectroscopy. The prospects for these applications are even more exciting with the advent of photonic integrated circuits. This Special Issue focuses on theoretical and experimental advances in the nonlinear dynamics of semiconductor lasers subject to different types of external perturbations.

spin-VCSELs --- laser arrays --- laser dynamics --- spin flip model --- coupled lasers --- optoelectronics --- OLED --- laser --- organic laser diode --- nonlinear dynamics --- quantum dot lasers --- optical feedback --- chaotic --- linewidth enhancement factor (LEF) --- interband cascade laser --- mid-infrared chaos --- semiconductor laser --- optical phase --- gain-switching --- spontaneous emission noise --- quantum random number generation --- semiconductor lasers --- mutual coupling --- asymmetric coupling strength --- symmetry breaking --- narrow-linewidth lasers --- laser stability --- long delay --- injection-locking --- noise --- simulation --- pulsation --- chaos --- optical injection --- excitability --- neuromorphic dynamics --- modulation --- locking --- low-frequency fluctuations --- optical frequency comb --- polarization switching --- VCSEL

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Emerging wide bandgap (WBG) semiconductors hold the potential to advance the global industry in the same way that, more than 50 years ago, the invention of the silicon (Si) chip enabled the modern computer era. SiC- and GaN-based devices are starting to become more commercially available. Smaller, faster, and more efficient than their counterpart Si-based components, these WBG devices also offer greater expected reliability in tougher operating conditions. Furthermore, in this frame, a new class of microelectronic-grade semiconducting materials that have an even larger bandgap than the previously established wide bandgap semiconductors, such as GaN and SiC, have been created, and are thus referred to as “ultra-wide bandgap” materials. These materials, which include AlGaN, AlN, diamond, Ga2O3, and BN, offer theoretically superior properties, including a higher critical breakdown field, higher temperature operation, and potentially higher radiation tolerance. These attributes, in turn, make it possible to use revolutionary new devices for extreme environments, such as high-efficiency power transistors, because of the improved Baliga figure of merit, ultra-high voltage pulsed power switches, high-efficiency UV-LEDs, and electronics. This Special Issue aims to collect high quality research papers, short communications, and review articles that focus on wide bandgap device design, fabrication, and advanced characterization. The Special Issue will also publish selected papers from the 43rd Workshop on Compound Semiconductor Devices and Integrated Circuits, held in France (WOCSDICE 2019), which brings together scientists and engineers working in the area of III–V, and other compound semiconductor devices and integrated circuits.

GaN --- high-electron-mobility transistor (HEMT) --- ultra-wide band gap --- GaN-based vertical-cavity surface-emitting laser (VCSEL) --- composition-graded AlxGa1−xN electron blocking layer (EBL) --- electron leakage --- GaN laser diode --- distributed feedback (DFB) --- surface gratings --- sidewall gratings --- AlGaN/GaN --- proton irradiation --- time-dependent dielectric breakdown (TDDB) --- reliability --- normally off --- power cycle test --- SiC micro-heater chip --- direct bonded copper (DBC) substrate --- Ag sinter paste --- wide band-gap (WBG) --- thermal resistance --- amorphous InGaZnO --- thin-film transistor --- nitrogen-doping --- buried-channel --- stability --- 4H-SiC --- turn-off loss --- ON-state voltage --- breakdown voltage (BV) --- IGBT --- wide-bandgap semiconductor --- high electron mobility transistors --- vertical gate structure --- normally-off operation --- gallium nitride --- asymmetric multiple quantum wells --- barrier thickness --- InGaN laser diodes --- optical absorption loss --- electron leakage current --- wide band gap semiconductors --- numerical simulation --- terahertz Gunn diode --- grooved-anode diode --- Gallium nitride (GaN) high-electron-mobility transistors (HEMTs) --- vertical breakdown voltage --- buffer trapping effect --- gallium nitride (GaN) --- power switching device --- active power filter (APF) --- power quality (PQ) --- metal-insulator-semiconductor high-electron-mobility transistor (MIS-HEMT) --- recessed gate --- double barrier --- high-electron-mobility transistors --- copper metallization --- millimeter wave --- wide bandgap semiconductors --- flexible devices --- silver nanoring --- silver nanowire --- polyol method --- cosolvent --- tungsten trioxide film --- spin coating --- optical band gap --- morphology --- electrochromism --- self-align --- hierarchical nanostructures --- ZnO nanorod/NiO nanosheet --- photon extraction efficiency --- photonic emitter --- wideband --- HEMT --- power amplifier --- jammer system --- GaN 5G --- high electron mobility transistors (HEMT) --- new radio --- RF front-end --- AESA radars --- transmittance --- distortions --- optimization --- GaN-on-GaN --- schottky barrier diodes --- high-energy α-particle detection --- low voltage --- thick depletion width detectors --- n/a